Mu FENG

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch bias characterization and method of using the same
- Patent number 11,675,274
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Yongfa Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of tuning process models
- Patent number 11,614,690
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Mu Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining stochastic variation of printed patterns
- Patent number 11,567,413
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Chang An Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Instant tuning method for accelerating resist and etch model calibr...
- Patent number 11,314,172
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Hongfei Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20240385530
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONVERTING METROLOGY DATA
- Publication number 20240377343
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Yunbo GUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20230314958
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMA...
- Publication number 20230298158
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING METRICS FOR A PORTION OF A PATTERN ON A SUBSTRATE
- Publication number 20230161269
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR IMPROVING PROCESS BASED CONTOUR INFORMATION OF STRUCTUR...
- Publication number 20220299881
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Yunan ZHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...
- Publication number 20220276563
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Lei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAUGE SELECTION FOR MODEL CALIBRATION
- Publication number 20220113632
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Lei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODELING POST-EXPOSURE PROCESSES
- Publication number 20210294218
- Publication date Sep 23, 2021
- ASML NETHERLANDS B.V.
- Yongfa FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS
- Publication number 20210208507
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSTANT TUNING METHOD FOR ACCELERATING RESIST AND ETCH MODEL CALIBR...
- Publication number 20210048751
- Publication date Feb 18, 2021
- ASML NETHERLANDS B.V.
- Hongfei SHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF TUNING PROCESS MODELS
- Publication number 20190369498
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Mu FENG
- G05 - CONTROLLING REGULATING
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20190354020
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for improving a process for a patterning process

Etch bias characterization and method of using the same

Methods of tuning process models

Method for determining stochastic variation of printed patterns

Instant tuning method for accelerating resist and etch model calibr...

Patents Applicationslast 30 patents

ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

METHOD FOR CONVERTING METROLOGY DATA

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME

APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMA...

DETERMINING METRICS FOR A PORTION OF A PATTERN ON A SUBSTRATE

METHODS FOR IMPROVING PROCESS BASED CONTOUR INFORMATION OF STRUCTUR...

PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...

GAUGE SELECTION FOR MODEL CALIBRATION

MODELING POST-EXPOSURE PROCESSES

METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS

INSTANT TUNING METHOD FOR ACCELERATING RESIST AND ETCH MODEL CALIBR...

METHODS OF TUNING PROCESS MODELS

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME