Mukund SRINIVASAN

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,545,504
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,430,801
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,328,928
- Issue date May 10, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On stack overlay improvement for 3D NAND
- Patent number 11,276,569
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D-NAND mold
- Patent number 11,189,635
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 11,152,248
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 10,998,329
- Issue date May 4, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process equipment
- Patent number 10,734,265
- Issue date Aug 4, 2020
- Applied Materials, Inc.
- Karthik Janakiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 10,707,116
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric-metal stack for 3D flash memory application
- Patent number 10,475,644
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Xinhai Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-assisted deposition of flowable films
- Patent number 10,460,936
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Brian Saxton Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of processing wafers with compressive or tensi...
- Patent number 10,403,535
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing substrates using small plasma chambers
- Patent number 10,332,727
- Issue date Jun 25, 2019
- Lam Research Corporation
- Richard Gottscho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system containing an isolation region separating a depos...
- Patent number 10,236,197
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Karthik Janakiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process equipment
- Patent number 10,056,279
- Issue date Aug 21, 2018
- Applied Materials, Inc.
- Karthik Janakiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic sequential processes for forming high quality thin films
- Patent number 10,041,167
- Issue date Aug 7, 2018
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric-metal stack for 3D flash memory application
- Patent number 9,972,487
- Issue date May 15, 2018
- Applied Materials, Inc.
- Xinhai Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small plasma chamber systems and methods
- Patent number 9,911,578
- Issue date Mar 6, 2018
- Lam Research Corporation
- Richard Gottscho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of metal doped amorphous carbon film
- Patent number 9,624,577
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra-thin dielectric diffusion barrier and etch stop layer for adv...
- Patent number 9,613,908
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Development of high etch selective hardmask material by ion implant...
- Patent number 9,412,613
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-K dielectric gapfill by flowable deposition
- Patent number 9,412,581
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of heteroatom-doped carbon films
- Patent number 9,406,509
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small plasma chamber systems and methods
- Patent number 9,111,729
- Issue date Aug 18, 2015
- Lam Research Corporation
- Richard Gottscho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated capacitive and inductive power sources for a plasma etch...
- Patent number 8,911,590
- Issue date Dec 16, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High lifetime consumable silicon nitride-silicon dioxide plasma pro...
- Patent number 8,622,021
- Issue date Jan 7, 2014
- Lam Research Corporation
- Travis R. Taylor
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Methods for RF pulsing of a narrow gap capacitively coupled reactor
- Patent number 8,337,713
- Issue date Dec 25, 2012
- Lam Research Corporation
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process tuning gas injection from the substrate edge
- Patent number 8,097,120
- Issue date Jan 17, 2012
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF pulsing of a narrow gap capacitively coupled reactor
- Patent number 7,976,673
- Issue date Jul 12, 2011
- Lam Research Corporation
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SIDEWALL PASSIVATION FOR PLASMA ETCHING
- Publication number 20230245895
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NAND CELL STRUCTURE WITH CHARGE TRAP CUT
- Publication number 20230164993
- Publication date May 25, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal High Concentration Boron Doping Of Semiconductors
- Publication number 20220246432
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20210257375
- Publication date Aug 19, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20210233918
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20200373310
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D-NAND MOLD
- Publication number 20200312874
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...
- Publication number 20200286773
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ON STACK OVERLAY IMPROVEMENT FOR 3D NAND
- Publication number 20200043723
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Yongjing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS
- Publication number 20190385851
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- SRINIVAS GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...
- Publication number 20180330980
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESS EQUIPMENT
- Publication number 20180308735
- Publication date Oct 25, 2018
- Applied Materials, Inc.
- Karthik JANAKIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC-METAL STACK FOR 3D FLASH MEMORY APPLICATION
- Publication number 20180247808
- Publication date Aug 30, 2018
- Applied Materials, Inc.
- Xinhai HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Atomic Layer Deposition Tool
- Publication number 20180155834
- Publication date Jun 7, 2018
- Applied Materials, Inc.
- Mukund Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for Processing Substrates Using Small Plasma Chambers
- Publication number 20180144906
- Publication date May 24, 2018
- LAM RESEARCH CORPORATION
- Richard Gottscho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of...
- Publication number 20180138023
- Publication date May 17, 2018
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS
- Publication number 20180040473
- Publication date Feb 8, 2018
- Applied Materials, Inc.
- Brian Saxton UNDERWOOD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
QUAD CHAMBER AND PLATFORM HAVING MULTIPLE QUAD CHAMBERS
- Publication number 20170194174
- Publication date Jul 6, 2017
- Applied Materials, Inc.
- Karthik JANAKIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC SEQUENTIAL PROCESSES FOR FORMING HIGH QUALITY THIN FILMS
- Publication number 20160244879
- Publication date Aug 25, 2016
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESS EQUIPMENT
- Publication number 20160218029
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Karthik JANAKIRAMAN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ULTRA-THIN DIELECTRIC DIFFUSION BARRIER AND ETCH STOP LAYER FOR ADV...
- Publication number 20160172239
- Publication date Jun 16, 2016
- Applied Materials, Inc.
- Deenesh PADHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System Containing An Isolation Region separating a Depos...
- Publication number 20160133489
- Publication date May 12, 2016
- Applied Materials, Inc.
- Karthik JANAKIRAMAN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...
- Publication number 20160049323
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Zheng John YE
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
DEPOSITION OF METAL DOPED AMORPHOUS CARBON FILM
- Publication number 20160027614
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Pramit MANNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K DIELECTRIC GAPFILL BY FLOWABLE DEPOSITION
- Publication number 20160020089
- Publication date Jan 21, 2016
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING PROCESS FOR CLEANING AMORPHOUS CARBON DEPOSITION RESIDUALS...
- Publication number 20150228463
- Publication date Aug 13, 2015
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
DEPOSITION OF HETEROATOM-DOPED CARBON FILMS
- Publication number 20150206739
- Publication date Jul 23, 2015
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC-METAL STACK FOR 3D FLASH MEMORY APPLICATION
- Publication number 20150206757
- Publication date Jul 23, 2015
- Applied Materials, Inc.
- XINHAI HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...
- Publication number 20150194317
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- PRAMIT MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS
- Publication number 20150187563
- Publication date Jul 2, 2015
- Applied Materials, Inc.
- BRIAN SAXTON UNDERWOOD
- H01 - BASIC ELECTRIC ELEMENTS

Mukund SRINIVASAN

Person

Patents Grantslast 30 patents

Conformal high concentration boron doping of semiconductors

Methods and apparatus for three dimensional NAND structure fabrication

Methods and apparatus for three dimensional NAND structure fabrication

Conformal high concentration boron doping of semiconductors

On stack overlay improvement for 3D NAND

3D-NAND mold

Cyclic flowable deposition and high-density plasma treatment proces...

Methods and apparatus for three dimensional NAND structure fabrication

Semiconductor process equipment

Cyclic flowable deposition and high-density plasma treatment proces...

Dielectric-metal stack for 3D flash memory application

Photo-assisted deposition of flowable films

Method and apparatus of processing wafers with compressive or tensi...

Methods for processing substrates using small plasma chambers

Processing system containing an isolation region separating a depos...

Semiconductor process equipment

Cyclic sequential processes for forming high quality thin films

Dielectric-metal stack for 3D flash memory application

Small plasma chamber systems and methods

Deposition of metal doped amorphous carbon film

Ultra-thin dielectric diffusion barrier and etch stop layer for adv...

Development of high etch selective hardmask material by ion implant...

Low-K dielectric gapfill by flowable deposition

Deposition of heteroatom-doped carbon films

Small plasma chamber systems and methods

Integrated capacitive and inductive power sources for a plasma etch...

High lifetime consumable silicon nitride-silicon dioxide plasma pro...

Methods for RF pulsing of a narrow gap capacitively coupled reactor

Process tuning gas injection from the substrate edge

RF pulsing of a narrow gap capacitively coupled reactor

Patents Applicationslast 30 patents

SIDEWALL PASSIVATION FOR PLASMA ETCHING

NAND CELL STRUCTURE WITH CHARGE TRAP CUT

Conformal High Concentration Boron Doping Of Semiconductors

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION

3D-NAND MOLD

CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...

ON STACK OVERLAY IMPROVEMENT FOR 3D NAND

CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS

CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...

SEMICONDUCTOR PROCESS EQUIPMENT

DIELECTRIC-METAL STACK FOR 3D FLASH MEMORY APPLICATION

Integrated Atomic Layer Deposition Tool

Methods for Processing Substrates Using Small Plasma Chambers

Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of...

PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS

QUAD CHAMBER AND PLATFORM HAVING MULTIPLE QUAD CHAMBERS

CYCLIC SEQUENTIAL PROCESSES FOR FORMING HIGH QUALITY THIN FILMS

SEMICONDUCTOR PROCESS EQUIPMENT

ULTRA-THIN DIELECTRIC DIFFUSION BARRIER AND ETCH STOP LAYER FOR ADV...

Processing System Containing An Isolation Region separating a Depos...

METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...

DEPOSITION OF METAL DOPED AMORPHOUS CARBON FILM

LOW-K DIELECTRIC GAPFILL BY FLOWABLE DEPOSITION

CLEANING PROCESS FOR CLEANING AMORPHOUS CARBON DEPOSITION RESIDUALS...

DEPOSITION OF HETEROATOM-DOPED CARBON FILMS

DIELECTRIC-METAL STACK FOR 3D FLASH MEMORY APPLICATION

DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...

PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS