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Mula Friedman
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Nes Ziona, IL
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Patents Grants
last 30 patents
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Patent Grant
Raster frame beam system for electron beam lithography
Patent number
7,842,935
Issue date
Nov 30, 2010
Applied Materials Israel, Ltd.
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Raster frame beam system for electron beam lithography
Patent number
7,521,700
Issue date
Apr 21, 2009
Applied Materials, Israel, Ltd.
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Raster frame beam system for electron beam lithography
Patent number
7,098,468
Issue date
Aug 29, 2006
Applied Materials, Inc.
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Alternating phase-shift mask inspection method and apparatus
Patent number
7,072,502
Issue date
Jul 4, 2006
Applied Materials, Inc.
Shirley Hemar
G01 - MEASURING TESTING
Information
Patent Grant
Data converter apparatus and method particularly useful for a datab...
Patent number
6,366,687
Issue date
Apr 2, 2002
Applied Materials, Inc.
Meir Aloni
G06 - COMPUTING CALCULATING COUNTING
Patents Applications
last 30 patents
Information
Patent Application
Raster Frame Beam System For Electron Beam Lithography
Publication number
20060243918
Publication date
Nov 2, 2006
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Raster Frame Beam System For Electron Beam Lithography
Publication number
20060243922
Publication date
Nov 2, 2006
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Raster frame beam system for electron beam lithography
Publication number
20050274911
Publication date
Dec 15, 2005
Meir Aloni
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Alternating phase-shift mask inspection method and apparatus
Publication number
20020186879
Publication date
Dec 12, 2002
Shirley Hemar
G01 - MEASURING TESTING