Munehiro Oota

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing liquid for CMP, and polishing method
- Patent number 10,155,886
- Issue date Dec 18, 2018
- Hitachi Chemical Company, Ltd.
- Munehiro Oota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for CMP, polishing liquid set for CMP, and polishi...
- Patent number 9,966,269
- Issue date May 8, 2018
- Hitachi Chemical Company, Ltd.
- Shigeru Yoshikawa
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid and method for polishing substrate using the polis...
- Patent number 9,564,337
- Issue date Feb 7, 2017
- Hitachi Chemical Co., Ltd.
- Munehiro Oota
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for CMP and polishing method using the same
- Patent number 8,853,082
- Issue date Oct 7, 2014
- Hitachi Chemical Company, Ltd.
- Masayuki Hanano
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 8,592,317
- Issue date Nov 26, 2013
- Hitachi Chemical Co., Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
CMP POLISHING LIQUID, AND POLISHING METHOD
- Publication number 20170210958
- Publication date Jul 27, 2017
- Hitachi Chemical Company, Ltd.
- Takashi SHINODA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...
- Publication number 20170200617
- Publication date Jul 13, 2017
- Hitachi Chemical Company, Ltd.
- Shigeru YOSHIKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLIS...
- Publication number 20170133237
- Publication date May 11, 2017
- Hitachi Chemical Company, Ltd.
- Munehiro Oota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR CMP, AND POLISHING METHOD
- Publication number 20160137881
- Publication date May 19, 2016
- Hitachi Chemical Company, Ltd.
- Munehiro OOTA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLIS...
- Publication number 20130260558
- Publication date Oct 3, 2013
- HITACHI CHEMICAL CO., Ltd.
- Munehiro Oota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR CMP AND POLISHING METHOD USING THE SAME
- Publication number 20120315763
- Publication date Dec 13, 2012
- Hitachi Chemical Company, Ltd.
- Masayuki Hanano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275217
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Munehiro Oota

Person

Patents Grantslast 30 patents

Polishing liquid for CMP, and polishing method

Polishing liquid for CMP, polishing liquid set for CMP, and polishi...

Polishing liquid and method for polishing substrate using the polis...

Polishing solution for CMP and polishing method using the polishing...

Polishing liquid for CMP and polishing method using the same

Polishing solution for CMP and polishing method using the polishing...

Patents Applicationslast 30 patents

CMP POLISHING LIQUID, AND POLISHING METHOD

POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...

POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLIS...

POLISHING LIQUID FOR CMP, AND POLISHING METHOD

POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLIS...

POLISHING LIQUID FOR CMP AND POLISHING METHOD USING THE SAME

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...