Muneo Furuse

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,569,177
- Issue date Oct 29, 2013
- Hitachi High-Technologies Corporation
- Tomohiro Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for operating the same
- Patent number 8,197,704
- Issue date Jun 12, 2012
- Hitachi High-Technologies Corporation
- Takahisa Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method
- Patent number 8,024,831
- Issue date Sep 27, 2011
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning apparatus
- Patent number 8,006,340
- Issue date Aug 30, 2011
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for detecting foreign material on the surface of...
- Patent number 7,526,948
- Issue date May 5, 2009
- Hitachi High-Technologies Corporation
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus, protecting layer therefor and installa...
- Patent number 7,052,731
- Issue date May 30, 2006
- Hitachi High-Technologies Corporation
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 6,914,005
- Issue date Jul 5, 2005
- Hitachi High-Technologies Corporation
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for coating internal surface of plasma processing chamber
- Patent number 6,875,477
- Issue date Apr 5, 2005
- Hitachi High-Technologies Corporation
- Douglas M. Trickett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,837,937
- Issue date Jan 4, 2005
- Hitachi High-Technologies Corporation
- Susumu Tauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for monitoring plasma processing apparatus
- Patent number 6,796,269
- Issue date Sep 28, 2004
- Hitchi High-Technologies Corporation
- Ichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,158,383
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface wave plasma processing apparatus
- Patent number 5,886,473
- Issue date Mar 23, 1999
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,804,033
- Issue date Sep 8, 1998
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130189800
- Publication date Jul 25, 2013
- Tomohiro OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning Method
- Publication number 20100294315
- Publication date Nov 25, 2010
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20100206845
- Publication date Aug 19, 2010
- Takahisa Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning apparatus and cleaning method
- Publication number 20100050349
- Publication date Mar 4, 2010
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20100050938
- Publication date Mar 4, 2010
- Hitachi High-Technologies Corporation
- Tsutomu Tetsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESS APPARATUS AND MEMBER FOR ETCHING PROCESS CHAMBER
- Publication number 20090183835
- Publication date Jul 23, 2009
- Muneo FURUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080314321
- Publication date Dec 25, 2008
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080236494
- Publication date Oct 2, 2008
- TADAYOSHI KAWAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching equipment
- Publication number 20080236744
- Publication date Oct 2, 2008
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and method for forming inner wall of plasm...
- Publication number 20070215278
- Publication date Sep 20, 2007
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus
- Publication number 20070044914
- Publication date Mar 1, 2007
- Katsuji Matano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and method for detecting foreign material on the surface of...
- Publication number 20070032088
- Publication date Feb 8, 2007
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
Member for plasma processing apparatus and plasma processing apparatus
- Publication number 20060157198
- Publication date Jul 20, 2006
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050199183
- Publication date Sep 15, 2005
- Masatsugu Arai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050193951
- Publication date Sep 8, 2005
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for coating internal surface of plasma processing chamber
- Publication number 20050112289
- Publication date May 26, 2005
- Douglas M. Trickett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for coating internal surface of plasma processing chamber
- Publication number 20050084617
- Publication date Apr 21, 2005
- Douglas M. Trickett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050051089
- Publication date Mar 10, 2005
- Susumu Tauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for monitoring plasma processing apparatus
- Publication number 20050051270
- Publication date Mar 10, 2005
- Ichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, protecting layer therefor and installa...
- Publication number 20050045107
- Publication date Mar 3, 2005
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for coating internal surface of plasma processing chamber
- Publication number 20040151841
- Publication date Aug 5, 2004
- Douglas M. Trickett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20040040507
- Publication date Mar 4, 2004
- Susumu Tauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20030201256
- Publication date Oct 30, 2003
- Susumu Tauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20030166343
- Publication date Sep 4, 2003
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, protecting layer therefor and installa...
- Publication number 20030159778
- Publication date Aug 28, 2003
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for monitoring plasma processing apparatus
- Publication number 20030102083
- Publication date Jun 5, 2003
- Ichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Muneo Furuse

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method for operating the same

Cleaning method

Cleaning apparatus

Device and method for detecting foreign material on the surface of...

Plasma processing apparatus, protecting layer therefor and installa...

Plasma etching method

Method for coating internal surface of plasma processing chamber

Plasma processing apparatus

Apparatus and method for monitoring plasma processing apparatus

Plasma processing method and apparatus

Surface wave plasma processing apparatus

Microwave plasma processing method and apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Cleaning Method

PLASMA PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME

Cleaning apparatus and cleaning method

Plasma processing apparatus

ETCHING PROCESS APPARATUS AND MEMBER FOR ETCHING PROCESS CHAMBER

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma etching equipment

Plasma etching apparatus and method for forming inner wall of plasm...

Vacuum processing apparatus

Device and method for detecting foreign material on the surface of...

Member for plasma processing apparatus and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Method for coating internal surface of plasma processing chamber

Method for coating internal surface of plasma processing chamber

Plasma processing apparatus

Method for monitoring plasma processing apparatus

Plasma processing apparatus, protecting layer therefor and installa...

Method for coating internal surface of plasma processing chamber

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma etching method

Plasma processing apparatus, protecting layer therefor and installa...

Apparatus and method for monitoring plasma processing apparatus