Munirathna Padmanaban

Person

Flemington, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Composition of spin-on materials containing metal oxide nanoparticl...
- Patent number 11,421,128
- Issue date Aug 23, 2022
- Merck Patent GmbH
- M. Dalil Rahman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aromatic amino siloxane functionalized materials for use in capping...
- Patent number 11,031,237
- Issue date Jun 8, 2021
- Merck Patent GmbH
- Sachin Bobade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polyoxometalate and heteropolyoxometalate compositions and methods...
- Patent number 9,418,836
- Issue date Aug 16, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Venkata Gopal Reddy Chada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin coatable metallic hard mask compositions and processes thereof
- Patent number 9,409,793
- Issue date Aug 9, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Venkata Gopal Reddy Chada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Stable metal compounds, their compositions and methods
- Patent number 9,315,636
- Issue date Apr 19, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Huirong Yao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Stable metal compounds as hardmasks and filling materials, their co...
- Patent number 9,296,922
- Issue date Mar 29, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Huirong Yao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antireflective coating compositions and processes thereof
- Patent number 9,274,426
- Issue date Mar 1, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- M. Dalil Rahman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Developable bottom anti-reflective coating
- Patent number 8,900,797
- Issue date Dec 2, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Superfine pattern mask, method for production thereof, and method e...
- Patent number 8,796,398
- Issue date Aug 5, 2014
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming a developable bottom antireflective coating
- Patent number 8,697,336
- Issue date Apr 15, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,632,948
- Issue date Jan 21, 2014
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom antireflective coating compositions and processes thereof
- Patent number 8,623,589
- Issue date Jan 7, 2014
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist compositions
- Patent number 8,252,503
- Issue date Aug 28, 2012
- AZ Electronic Materials USA Corp.
- Srinivasan Chakrapani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoactive compounds
- Patent number 7,833,693
- Issue date Nov 16, 2010
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoactive compounds
- Patent number 7,678,528
- Issue date Mar 16, 2010
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 7,595,141
- Issue date Sep 29, 2009
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for deep UV and process thereof
- Patent number 7,537,879
- Issue date May 26, 2009
- AZ Electronic Materials USA Corp.
- Francis M. Houlihan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoactive compounds
- Patent number 7,521,170
- Issue date Apr 21, 2009
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoactive compounds
- Patent number 7,491,482
- Issue date Feb 17, 2009
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions
- Patent number 7,122,291
- Issue date Oct 17, 2006
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep ultraviolet lithography comprising...
- Patent number 6,991,888
- Issue date Jan 31, 2006
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for anti-reflective coating or radiation absorbing coat...
- Patent number 6,803,168
- Issue date Oct 12, 2004
- Clariant Finance (BVI) Limited
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative deep ultraviolet photoresist
- Patent number 6,800,416
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,737,492
- Issue date May 18, 2004
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition for deep UV radiation containing an additive
- Patent number 6,723,488
- Issue date Apr 20, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing film forming resins for photoresist compositions
- Patent number 6,610,465
- Issue date Aug 26, 2003
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,468,718
- Issue date Oct 22, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition for deep UV and process thereof
- Patent number 6,447,980
- Issue date Sep 10, 2002
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for deep UV radiation
- Patent number 6,365,322
- Issue date Apr 2, 2002
- Clariant Finance (BVI) Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflection or light-absorbing coating composition and polymer t...
- Patent number 6,329,117
- Issue date Dec 11, 2001
- Clariant International, Ltd.
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AROMATIC AMINO SILOXANE FUNCTIONALIZED MATERIALS FOR USE IN CAPPING...
- Publication number 20200273701
- Publication date Aug 27, 2020
- Merck Patent GmbH
- Sachin BOBADE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION OF SPIN-ON MATERIALS CONTAINING METAL OXIDE NANOPARTICL...
- Publication number 20200087534
- Publication date Mar 19, 2020
- RIDGEFIELD ACQUISITION
- M. Dalil RAHMAN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20150309410
- Publication date Oct 29, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil RAHMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20150309403
- Publication date Oct 29, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil RAHMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN COATABLE METALLIC HARD MASK COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20150200090
- Publication date Jul 16, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Venkata Gopal Reddy CHADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYOXOMETALATE AND HETEROPOLYOXOMETALATE COMPOSITIONS AND METHODS...
- Publication number 20150200091
- Publication date Jul 16, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Venkata Gopal Reddy CHADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR C...
- Publication number 20150064904
- Publication date Mar 5, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Huirong YAO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20140193753
- Publication date Jul 10, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STABLE METAL COMPOUNDS, THEIR COMPOSITIONS AND METHODS
- Publication number 20140159278
- Publication date Jun 12, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Huirong YAO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING
- Publication number 20140087311
- Publication date Mar 27, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20130157196
- Publication date Jun 20, 2013
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20120308939
- Publication date Dec 6, 2012
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Superfine Pattern Mask, Method for Production Thereof, and Method E...
- Publication number 20120160801
- Publication date Jun 28, 2012
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer Developable Coating Compositions and Processes Thereof
- Publication number 20120122029
- Publication date May 17, 2012
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Edge Bead Remover For Coatings
- Publication number 20120108067
- Publication date May 3, 2012
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20110086312
- Publication date Apr 14, 2011
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20110076626
- Publication date Mar 31, 2011
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Composition
- Publication number 20100136477
- Publication date Jun 3, 2010
- Edward W. Ng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist Image-Forming Process Using Double Patterning
- Publication number 20090253080
- Publication date Oct 8, 2009
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACTIVE COMPOUNDS
- Publication number 20090087782
- Publication date Apr 2, 2009
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITIONS
- Publication number 20090053652
- Publication date Feb 26, 2009
- Srinivasan Chakrapani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist Composition for Deep UV and Process Thereof
- Publication number 20090042148
- Publication date Feb 12, 2009
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoactive Compounds
- Publication number 20080187868
- Publication date Aug 7, 2008
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers Useful in Photoresist Compositions and Compositions Thereof
- Publication number 20080171270
- Publication date Jul 17, 2008
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoactive Compounds
- Publication number 20080131811
- Publication date Jun 5, 2008
- Munirathna Padmanaban
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS
- Publication number 20080035556
- Publication date Feb 14, 2008
- Munirathna Padmanaban
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Photoactive compounds
- Publication number 20070111138
- Publication date May 17, 2007
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoactive compounds
- Publication number 20070015084
- Publication date Jan 18, 2007
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist composition for deep UV and process thereof
- Publication number 20060110677
- Publication date May 25, 2006
- Francis M. Houlihan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for producing film forming resins for photoresist compositions
- Publication number 20060102554
- Publication date May 18, 2006
- Munirathna Padmanaban
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Munirathna Padmanaban

Person

Patents Grantslast 30 patents

Composition of spin-on materials containing metal oxide nanoparticl...

Aromatic amino siloxane functionalized materials for use in capping...

Polyoxometalate and heteropolyoxometalate compositions and methods...

Spin coatable metallic hard mask compositions and processes thereof

Stable metal compounds, their compositions and methods

Stable metal compounds as hardmasks and filling materials, their co...

Antireflective coating compositions and processes thereof

Developable bottom anti-reflective coating

Superfine pattern mask, method for production thereof, and method e...

Composition for forming a developable bottom antireflective coating

Positive-working photoimageable bottom antireflective coating

Bottom antireflective coating compositions and processes thereof

Photoresist compositions

Photoactive compounds

Photoactive compounds

Composition for coating over a photoresist pattern

Photoresist composition for deep UV and process thereof

Photoactive compounds

Photoactive compounds

Photoresist compositions

Photoresist composition for deep ultraviolet lithography comprising...

Composition for anti-reflective coating or radiation absorbing coat...

Negative deep ultraviolet photoresist

Radiation absorbing polymer, composition for radiation absorbing co...

Photoresist composition for deep UV radiation containing an additive

Process for producing film forming resins for photoresist compositions

Radiation absorbing polymer, composition for radiation absorbing co...

Photoresist composition for deep UV and process thereof

Photoresist composition for deep UV radiation

Antireflection or light-absorbing coating composition and polymer t...

Patents Applicationslast 30 patents

AROMATIC AMINO SILOXANE FUNCTIONALIZED MATERIALS FOR USE IN CAPPING...

COMPOSITION OF SPIN-ON MATERIALS CONTAINING METAL OXIDE NANOPARTICL...

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

SPIN COATABLE METALLIC HARD MASK COMPOSITIONS AND PROCESSES THEREOF

POLYOXOMETALATE AND HETEROPOLYOXOMETALATE COMPOSITIONS AND METHODS...

STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR C...

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING

STABLE METAL COMPOUNDS, THEIR COMPOSITIONS AND METHODS

DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING

BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

Superfine Pattern Mask, Method for Production Thereof, and Method E...

Underlayer Developable Coating Compositions and Processes Thereof

Edge Bead Remover For Coatings

Positive-Working Photoimageable Bottom Antireflective Coating

Positive-Working Photoimageable Bottom Antireflective Coating

Photosensitive Composition

Photoresist Image-Forming Process Using Double Patterning

PHOTOACTIVE COMPOUNDS

PHOTORESIST COMPOSITIONS

Photoresist Composition for Deep UV and Process Thereof

Photoactive Compounds

Polymers Useful in Photoresist Compositions and Compositions Thereof

Photoactive Compounds

PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS

Photoactive compounds

Photoactive compounds

Photoresist composition for deep UV and process thereof

Process for producing film forming resins for photoresist compositions