Munirathna Padmanaban

Person

Saitama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Acid-labile group protected hydroxystyrene polymers or copolymers t...
- Patent number 5,852,128
- Issue date Dec 22, 1998
- Clariant AG
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition containing plasticizer
- Patent number 5,846,690
- Issue date Dec 8, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,843,319
- Issue date Dec 1, 1998
- Hoechst Japan Limited
- Klaus Juergen Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,773,191
- Issue date Jun 30, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,738,972
- Issue date Apr 14, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture comprising a basic iodonium compound
- Patent number 5,663,035
- Issue date Sep 2, 1997
- Hoechst Japan Limited
- Seiya Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Colored, photosensitive resin composition
- Patent number 5,641,594
- Issue date Jun 24, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,595,855
- Issue date Jan 21, 1997
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,525,453
- Issue date Jun 11, 1996
- Hoechst Japan Limited
- Klaus J. Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Munirathna Padmanaban

Person

Patents Grantslast 30 patents

Acid-labile group protected hydroxystyrene polymers or copolymers t...

Radiation-sensitive composition containing plasticizer

Positive-working radiation-sensitive mixture

Radiation-sensitive composition

Radiation sensitive composition

Radiation-sensitive mixture comprising a basic iodonium compound

Colored, photosensitive resin composition

Radiation sensitive composition

Positive-working radiation-sensitive mixture