Murray D. Sirkis

Person

Tempe, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for improved plasma processing uniformity
- Patent number 7,164,236
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Addition of power at selected harmonics of plasma processor drive f...
- Patent number 6,917,204
- Issue date Jul 12, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of wafer band-edge measurement using transmission spectrosco...
- Patent number 6,891,124
- Issue date May 10, 2005
- Tokyo Electron Limited
- Medona B. Denton
- G01 - MEASURING TESTING
Information Patent Grant
Electron density measurement and plasma process control system usin...
- Patent number 6,861,844
- Issue date Mar 1, 2005
- Tokyo Electron Limited
- Joseph T. Verdeyen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Stabilized oscillator circuit for plasma density measurement
- Patent number 6,799,532
- Issue date Oct 5, 2004
- Tokyo Electron Limited
- Murray D. Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Automated electrode replacement apparatus for a plasma processing s...
- Patent number 6,753,498
- Issue date Jun 22, 2004
- Tokyo Electron Limited
- Murray D. Sirkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron density measurement and plasma process control system usin...
- Patent number 6,741,944
- Issue date May 25, 2004
- Tokyo Electron Limited
- Joseph T. Verdeyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determination and control of plasma state
- Patent number 6,713,969
- Issue date Mar 30, 2004
- Tokyo Electron Limited
- Murray Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Stabilized oscillator circuit for plasma density measurement
- Patent number 6,646,386
- Issue date Nov 11, 2003
- Tokyo Electron Limited
- Murray D. Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron density measurement and control system using plasma-induce...
- Patent number 6,573,731
- Issue date Jun 3, 2003
- Tokyo Electron Limited
- Joseph T. Verdeyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying ink deposited by ink jet printing
- Patent number 5,631,685
- Issue date May 20, 1997
- Xerox Corporation
- Arthur M. Gooray
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Means and methods for heating semiconductor ribbons and wafers with...
- Patent number 4,714,810
- Issue date Dec 22, 1987
- Arizona Board of Regents
- Murray D. Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20040168770
- Publication date Sep 2, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Addition of power at selected harmonics of plasma processor drive f...
- Publication number 20040035837
- Publication date Feb 26, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Stabilized oscillator circuit for plasma density measurement
- Publication number 20040007983
- Publication date Jan 15, 2004
- TOKYO ELECTRON LIMITED
- Murray D. Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for determination and control of plasma state
- Publication number 20030141822
- Publication date Jul 31, 2003
- TOKYO ELECTRON LIMITED
- Murray Sirkis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20030137251
- Publication date Jul 24, 2003
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Automated electrode replacement apparatus for a plasma processing s...
- Publication number 20030127433
- Publication date Jul 10, 2003
- Murray D. Sirkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for plasma processing system
- Publication number 20030106793
- Publication date Jun 12, 2003
- Murray D. Sirkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode apparatus and method for plasma processing
- Publication number 20030106644
- Publication date Jun 12, 2003
- Murray D. Sirkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of wafer band-edge measurement using transmission spectrosco...
- Publication number 20020189757
- Publication date Dec 19, 2002
- Medona B. Denton
- G01 - MEASURING TESTING
Information Patent Application
Method and system for reducing damage to substrates during plasma p...
- Publication number 20020187280
- Publication date Dec 12, 2002
- TOKYO ELECTRON LIMITED
- Wayne L. Johnson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Murray D. Sirkis

Person

Patents Grantslast 30 patents

Method and apparatus for improved plasma processing uniformity

Addition of power at selected harmonics of plasma processor drive f...

Method of wafer band-edge measurement using transmission spectrosco...

Electron density measurement and plasma process control system usin...

Stabilized oscillator circuit for plasma density measurement

Automated electrode replacement apparatus for a plasma processing s...

Electron density measurement and plasma process control system usin...

Method and apparatus for determination and control of plasma state

Stabilized oscillator circuit for plasma density measurement

Electron density measurement and control system using plasma-induce...

Apparatus and method for drying ink deposited by ink jet printing

Means and methods for heating semiconductor ribbons and wafers with...

Patents Applicationslast 30 patents

Method and apparatus for improved plasma processing uniformity

Addition of power at selected harmonics of plasma processor drive f...

Stabilized oscillator circuit for plasma density measurement

Method and apparatus for determination and control of plasma state

Method and apparatus for improved plasma processing uniformity

Automated electrode replacement apparatus for a plasma processing s...

Electrode for plasma processing system

Electrode apparatus and method for plasma processing

Method of wafer band-edge measurement using transmission spectrosco...

Method and system for reducing damage to substrates during plasma p...