Mutsuko SAITO

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Niigata-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Copper electroplating solution and method of copper electroplating
- Patent number 9,175,413
- Issue date Nov 3, 2015
- Rohm and Haas Electronic Materials LLC
- Mutsuko Saito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrolytic copper plating solution and method of electrolytic cop...
- Patent number 9,169,576
- Issue date Oct 27, 2015
- Rohm and Haas Electronic Materials LLC
- Mutsuko Saito
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic copper plating liquid and the electrolytic copper plat...
- Patent number 9,150,976
- Issue date Oct 6, 2015
- Rohm and Haas Electronic Materials LLC
- Mutsuko Saito
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
ELECTROLYTIC COPPER PLATING SOLUTION
- Publication number 20160186348
- Publication date Jun 30, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Yoko Mizuno
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
COPPER ELECTROPLATING SOLUTION AND METHOD OF COPPER ELECTROPLATING
- Publication number 20140183052
- Publication date Jul 3, 2014
- Rohm and Haas Electronic Materials L.L.C.
- Mutsuko SAITO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC COPPER PLATING LIQUID AND THE ELECTROLYTIC COPPER PLAT...
- Publication number 20140097087
- Publication date Apr 10, 2014
- Mutsuko SAITO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC COPPER PLATING SOLUTION AND METHOD OF ELECTROLYTIC COP...
- Publication number 20130319867
- Publication date Dec 5, 2013
- Mutsuko SAITO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
TIN PLATING SOLUTION
- Publication number 20120132530
- Publication date May 31, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Shinjiro HAYASHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR