Myung A Jeon

Person

Yeosu-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,198,950
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Myung A Jeon
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus including nozzle unit and substrate...
- Patent number 12,134,113
- Issue date Nov 5, 2024
- Semes Co., Ltd.
- Ju Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and liquid supplying method
- Patent number 11,664,212
- Issue date May 30, 2023
- Semes Co., Ltd.
- Yong Hoon Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Unit for supplying liquid, apparatus and method for treating substr...
- Patent number 11,658,048
- Issue date May 23, 2023
- Semes Co., Ltd.
- Seong Soo Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OZONE WATER SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...
- Publication number 20250041911
- Publication date Feb 6, 2025
- SEMES CO., LTD.
- Myung A JEON
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...
- Publication number 20250025923
- Publication date Jan 23, 2025
- SEMES CO., LTD.
- Ju Hwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD THEREOF
- Publication number 20240210836
- Publication date Jun 27, 2024
- SEMES CO., LTD.
- Myung A JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FLUID TREATMENT APPARATUS, AND WAFER CLEANING APPARATUS AND...
- Publication number 20240145265
- Publication date May 2, 2024
- SEMES CO., LTD.
- Young Seop CHOI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...
- Publication number 20240091819
- Publication date Mar 21, 2024
- SEMES CO., LTD.
- Ju Hwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPRAY UNIT AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
- Publication number 20240042493
- Publication date Feb 8, 2024
- SEMES CO., LTD.
- Myung A. JEON
- B08 - CLEANING
Information Patent Application
OZONE WATER DECOMPOSITION APPARATUS AND METHOD
- Publication number 20230339790
- Publication date Oct 26, 2023
- SEMES CO., LTD.
- Myung A JEON
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
UNIT AND METHOD FOR DECOMPOSING OZONE, AND SUBSTRATE TREATING APPAR...
- Publication number 20230212044
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Bok Kyu Lee
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230005768
- Publication date Jan 5, 2023
- SEMES CO., LTD.
- MYUNG A JEON
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATING APPARATUS AND LIQUID SUPPLYING METHOD
- Publication number 20210335596
- Publication date Oct 28, 2021
- Semes Co., LTD.
- Yong Hoon HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIT FOR SUPPLYING LIQUID, APPARATUS AND METHOD FOR TREATING SUBSTR...
- Publication number 20200402818
- Publication date Dec 24, 2020
- SEMES CO., LTD.
- Seong Soo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20190362993
- Publication date Nov 28, 2019
- SEMES CO., LTD.
- Myung A Jeon
- H01 - BASIC ELECTRIC ELEMENTS

Myung A Jeon

Person

Patents Grantslast 30 patents

Apparatus and method for processing substrate

Substrate processing apparatus including nozzle unit and substrate...

Substrate treating apparatus and liquid supplying method

Unit for supplying liquid, apparatus and method for treating substr...

Patents Applicationslast 30 patents

OZONE WATER SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...

SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...

SUBSTRATE PROCESSING APPARATUS AND METHOD THEREOF

PROCESS FLUID TREATMENT APPARATUS, AND WAFER CLEANING APPARATUS AND...

SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...

SPRAY UNIT AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME

OZONE WATER DECOMPOSITION APPARATUS AND METHOD

UNIT AND METHOD FOR DECOMPOSING OZONE, AND SUBSTRATE TREATING APPAR...

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

SUBSTRATE TREATING APPARATUS AND LIQUID SUPPLYING METHOD

UNIT FOR SUPPLYING LIQUID, APPARATUS AND METHOD FOR TREATING SUBSTR...

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE