Myungjun Lee

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Metrology using overlay and yield critical patterns
- Patent number 10,685,165
- Issue date Jun 16, 2020
- KLA-Tencor Corporation
- Daniel Kandel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process-sensitive metrology systems and methods
- Patent number 10,216,096
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for focus-sensitive metrology targets
- Patent number 10,209,627
- Issue date Feb 19, 2019
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for fabricating metrology targets with sub-reso...
- Patent number 10,095,122
- Issue date Oct 9, 2018
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for fabricating metrology targets oriented with a...
- Patent number 10,018,919
- Issue date Jul 10, 2018
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Systems and Methods for Focus-Sensitive Metrology Targets
- Publication number 20180196358
- Publication date Jul 12, 2018
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method for Fabricating Metrology Targets Oriented with a...
- Publication number 20170343903
- Publication date Nov 30, 2017
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process-Sensitive Metrology Systems and Methods
- Publication number 20170045826
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Myungjun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20170023358
- Publication date Jan 26, 2017
- KLA-Tencor Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS
- Publication number 20160253450
- Publication date Sep 1, 2016
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING

Myungjun Lee

Person

Patents Grantslast 30 patents

Metrology target design for tilted device designs

Metrology using overlay and yield critical patterns

Process compatibility improvement by fill factor modulation

Process-sensitive metrology systems and methods

Systems and methods for focus-sensitive metrology targets

Systems and methods for fabricating metrology targets with sub-reso...

System and method for fabricating metrology targets oriented with a...

Patents Applicationslast 30 patents

Systems and Methods for Focus-Sensitive Metrology Targets

Process Compatibility Improvement by Fill Factor Modulation

System and Method for Fabricating Metrology Targets Oriented with a...

Process-Sensitive Metrology Systems and Methods

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS