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Na Zhang
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Naperville, IL, US
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Patents Grants
last 30 patents
Information
Patent Grant
Derivatized polyamino acids
Patent number
11,492,514
Issue date
Nov 8, 2022
CMC Materials, Inc.
Na Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Composition for tungsten CMP
Patent number
10,676,647
Issue date
Jun 9, 2020
Cabot Microelectronics Corporation
Na Zhang
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURF...
Publication number
20240101865
Publication date
Mar 28, 2024
CMC Materials LLC
Na ZHANG
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE
Publication number
20230070776
Publication date
Mar 9, 2023
CMC Materials, Inc.
Yang-Yao Lee
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
DERIVATIZED POLYAMINO ACIDS
Publication number
20210206920
Publication date
Jul 8, 2021
CMC Materials, Inc.
Na ZHANG
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
COMPOSITION AND METHOD FOR DIELECTRIC CMP
Publication number
20210115298
Publication date
Apr 22, 2021
Cabot Microelectronics Corporation, nka CMC Materials, Inc.
Sarah BROSNAN
C01 - INORGANIC CHEMISTRY
Information
Patent Application
COMPOSITION AND METHOD FOR DIELECTRIC CMP
Publication number
20210115299
Publication date
Apr 22, 2021
CMC Materials, Inc.
Sarah BROSNAN
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
COMPOSITION FOR TUNGSTEN CMP
Publication number
20200208014
Publication date
Jul 2, 2020
Cabot Microelectronics Corporation
Na ZHANG
H01 - BASIC ELECTRIC ELEMENTS