Nadav Gutman

Person

Zichron Ya'aqov, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Device feature specific edge placement error (EPE)
- Patent number 12,092,966
- Issue date Sep 17, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,862,524
- Issue date Jan 2, 2024
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay design for electron beam and scatterometry overlay measurem...
- Patent number 11,720,031
- Issue date Aug 8, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,703,767
- Issue date Jul 18, 2023
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for overlay measurement based on soft X-ray Sca...
- Patent number 11,698,251
- Issue date Jul 11, 2023
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage, multi-zone substrate positioning systems
- Patent number 11,637,030
- Issue date Apr 25, 2023
- KLA Corporation
- Yoram Uziel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Non-orthogonal target and method for using the same in measuring mi...
- Patent number 11,409,205
- Issue date Aug 9, 2022
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for measuring diagonal diffraction-base...
- Patent number 11,353,321
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Performance optimized scanning sequence for eBeam metrology and ins...
- Patent number 11,209,737
- Issue date Dec 28, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancing metrology target information content
- Patent number 11,085,754
- Issue date Aug 10, 2021
- KLA Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration measurements using combined optical and electron be...
- Patent number 11,075,126
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct focusing with image binning in metrology tools
- Patent number 10,897,566
- Issue date Jan 19, 2021
- KLA-Tencor Corporation
- Nadav Gutman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Estimating amplitude and phase asymmetry in imaging technology for...
- Patent number 10,866,090
- Issue date Dec 15, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for generating programmed defects for use in metr...
- Patent number 10,768,533
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Hong Xiao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
On the fly target acquisition
- Patent number 10,684,563
- Issue date Jun 16, 2020
- KLA-Tencor Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay measurement using phase and amplitude modeling
- Patent number 10,622,238
- Issue date Apr 14, 2020
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Grant
Utilizing overlay misregistration error estimations in imaging over...
- Patent number 10,565,697
- Issue date Feb 18, 2020
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology and control of overlay and edge placement errors
- Patent number 10,533,848
- Issue date Jan 14, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Target location in semiconductor manufacturing
- Patent number 10,504,802
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Naomi Ittah
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for device-correlated overlay metrology
- Patent number 10,474,040
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Frank Laske
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurements of overlapping target structures based on symm...
- Patent number 10,473,460
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Identifying process variations during product manufacture
- Patent number 10,379,449
- Issue date Aug 13, 2019
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus metrology and targets which utilize transformations based on...
- Patent number 10,197,922
- Issue date Feb 5, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus measurements using scatterometry metrology
- Patent number 9,934,353
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Mohamed El Kodadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach for model calibration used for focus and dose measurement
- Patent number 9,841,689
- Issue date Dec 12, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)
- Publication number 20240168391
- Publication date May 23, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Overlay Estimation Based on Optical Inspection and Machine Learning
- Publication number 20240142883
- Publication date May 2, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS...
- Publication number 20240094639
- Publication date Mar 21, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20230324810
- Publication date Oct 12, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220415725
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220413395
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...
- Publication number 20220413394
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING...
- Publication number 20220005668
- Publication date Jan 6, 2022
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Performance Optimized Scanning Sequence for eBeam Metrology and Ins...
- Publication number 20210405540
- Publication date Dec 30, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology System and Method for Measuring Diagonal Diffraction-Base...
- Publication number 20210389125
- Publication date Dec 16, 2021
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Application
Non-Orthogonal Target and Method for Using the Same in Measuring Mi...
- Publication number 20210364935
- Publication date Nov 25, 2021
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...
- Publication number 20210207956
- Publication date Jul 8, 2021
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Stage, Multi-Zone Substrate Positioning Systems
- Publication number 20200402827
- Publication date Dec 24, 2020
- KLA Corporation
- Yoram Uziel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Misregistration Measurements Using Combined Optical and Electron Be...
- Publication number 20200266112
- Publication date Aug 20, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Estimating Amplitude and Phase Asymmetry in Imaging Technology for...
- Publication number 20200132445
- Publication date Apr 30, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
Overlay Measurement Using Phase and Amplitude Modeling
- Publication number 20190378737
- Publication date Dec 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology and Control of Overlay and Edge Placement Errors
- Publication number 20190271542
- Publication date Sep 5, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
On The Fly Target Acquisition
- Publication number 20190228518
- Publication date Jul 25, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Direct Focusing with Image Binning in Metrology Tools
- Publication number 20190208108
- Publication date Jul 4, 2019
- KLA-Tencor Corporation
- Nadav GUTMAN
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Overlay Measurements of Overlapping Target Structures Based on Symm...
- Publication number 20190178639
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Application
Enhancing Metrology Target Information Content
- Publication number 20190178630
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY
- Publication number 20190179231
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Frank Laske
- G01 - MEASURING TESTING
Information Patent Application
UTILIZING OVERLAY MISREGISTRATION ERROR ESTIMATIONS IN IMAGING OVER...
- Publication number 20190122357
- Publication date Apr 25, 2019
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFYING PROCESS VARIATIONS DURING PRODUCT MANUFACTURE
- Publication number 20190033730
- Publication date Jan 31, 2019
- KLA-Tencor Corporation
- Tzahi GRUNZWEIG
- G01 - MEASURING TESTING
Information Patent Application
Target Location in Semiconductor Manufacturing
- Publication number 20180301385
- Publication date Oct 18, 2018
- KLA-Tencor Corporation
- Naomi Ittah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Generating Programmed Defects for Use in Metr...
- Publication number 20180113387
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Hong Xiao
- G01 - MEASURING TESTING
Information Patent Application
Focus Metrology and Targets Which Utilize Transformations Based on...
- Publication number 20170212427
- Publication date Jul 27, 2017
- KLA-Tencor Corporation
- Nadav Gutman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY
- Publication number 20160103946
- Publication date Apr 14, 2016
- KLA-Tencor Corporation
- Mohamed El Kodadi
- G01 - MEASURING TESTING

Nadav Gutman

Person

Patents Grantslast 30 patents

Device feature specific edge placement error (EPE)

Overlay mark design for electron beam overlay

Enhancing performance of overlay metrology

Overlay mark design for electron beam overlay

Overlay design for electron beam and scatterometry overlay measurem...

Overlay mark design for electron beam overlay

Methods and systems for overlay measurement based on soft X-ray Sca...

Multi-stage, multi-zone substrate positioning systems

Enhancing performance of overlay metrology

Non-orthogonal target and method for using the same in measuring mi...

Metrology system and method for measuring diagonal diffraction-base...

Performance optimized scanning sequence for eBeam metrology and ins...

Enhancing metrology target information content

Misregistration measurements using combined optical and electron be...

Direct focusing with image binning in metrology tools

Estimating amplitude and phase asymmetry in imaging technology for...

Method and system for generating programmed defects for use in metr...

On the fly target acquisition

Overlay measurement using phase and amplitude modeling

Utilizing overlay misregistration error estimations in imaging over...

Metrology and control of overlay and edge placement errors

Target location in semiconductor manufacturing

Systems and methods for device-correlated overlay metrology

Overlay measurements of overlapping target structures based on symm...

Identifying process variations during product manufacture

Focus metrology and targets which utilize transformations based on...

Focus measurements using scatterometry metrology

Approach for model calibration used for focus and dose measurement

Patents Applicationslast 30 patents

DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)

Overlay Estimation Based on Optical Inspection and Machine Learning

HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING...

Performance Optimized Scanning Sequence for eBeam Metrology and Ins...

Metrology System and Method for Measuring Diagonal Diffraction-Base...

Non-Orthogonal Target and Method for Using the Same in Measuring Mi...

Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...

Multi-Stage, Multi-Zone Substrate Positioning Systems

Misregistration Measurements Using Combined Optical and Electron Be...

Estimating Amplitude and Phase Asymmetry in Imaging Technology for...

Overlay Measurement Using Phase and Amplitude Modeling

Metrology and Control of Overlay and Edge Placement Errors

On The Fly Target Acquisition

Direct Focusing with Image Binning in Metrology Tools

Overlay Measurements of Overlapping Target Structures Based on Symm...

Enhancing Metrology Target Information Content

SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY

UTILIZING OVERLAY MISREGISTRATION ERROR ESTIMATIONS IN IMAGING OVER...

IDENTIFYING PROCESS VARIATIONS DURING PRODUCT MANUFACTURE

Target Location in Semiconductor Manufacturing

Method and System for Generating Programmed Defects for Use in Metr...

Focus Metrology and Targets Which Utilize Transformations Based on...

FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY