Nader Shamma

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 11,322,351
- Issue date May 3, 2022
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 11,257,674
- Issue date Feb 22, 2022
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling a patterning process, lithographic apparatus,...
- Patent number 11,048,174
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Michael Kubis
- G01 - MEASURING TESTING
Information Patent Grant
Modification of SNO2 surface for EUV lithography
- Patent number 11,031,244
- Issue date Jun 8, 2021
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 10,796,912
- Issue date Oct 6, 2020
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching substrates using ALE and selective deposition
- Patent number 10,685,836
- Issue date Jun 16, 2020
- Lam Research Corporation
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 10,546,748
- Issue date Jan 28, 2020
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low roughness EUV lithography
- Patent number 10,438,807
- Issue date Oct 8, 2019
- Lam Research Corporation
- Richard Wise
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching substrates using ale and selective deposition
- Patent number 10,269,566
- Issue date Apr 23, 2019
- Lam Research Corporation
- Samantha Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Soft landing nanolaminates for advanced patterning
- Patent number 10,192,742
- Issue date Jan 29, 2019
- Novellus Systems, Inc.
- Frank L. Pasquale
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Image reversal with AHM gap fill for multiple patterning
- Patent number 10,192,759
- Issue date Jan 29, 2019
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low roughness EUV lithography
- Patent number 9,922,839
- Issue date Mar 20, 2018
- Lam Research Corporation
- Richard Wise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Soft landing nanolaminates for advanced patterning
- Patent number 9,905,423
- Issue date Feb 27, 2018
- Novellus Systems, Inc.
- Frank L. Pasquale
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD films for EUV lithography
- Patent number 9,618,846
- Issue date Apr 11, 2017
- Lam Research Corporation
- Nader Shamma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Soft landing nanolaminates for advanced patterning
- Patent number 9,390,909
- Issue date Jul 12, 2016
- Novellus Systems, Inc.
- Frank L. Pasquale
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a mask by etching conformal film on patterned as...
- Patent number 9,362,133
- Issue date Jun 7, 2016
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD films for EUV lithography
- Patent number 9,304,396
- Issue date Apr 5, 2016
- Lam Research Corporation
- Nader Shamma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220270877
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...
- Publication number 20220197147
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Andrew LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220165571
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20220122846
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20210265163
- Publication date Aug 26, 2021
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20200402801
- Publication date Dec 24, 2020
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...
- Publication number 20200233311
- Publication date Jul 23, 2020
- Michael KUBIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20200083044
- Publication date Mar 12, 2020
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION OF SNO2 SURFACE FOR EUV LITHOGRAPHY
- Publication number 20200058492
- Publication date Feb 20, 2020
- LAM RESEARCH CORPORATION
- Akhil Singhal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20190244805
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20180337046
- Publication date Nov 22, 2018
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20180240667
- Publication date Aug 23, 2018
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ROUGHNESS EUV LITHOGRAPHY
- Publication number 20180190503
- Publication date Jul 5, 2018
- LAM RESEARCH CORPORATION
- Richard Wise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING
- Publication number 20180158683
- Publication date Jun 7, 2018
- Novellus Systems, Inc.
- Frank L. Pasquale
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20170316935
- Publication date Nov 2, 2017
- LAM RESEARCH CORPORATION
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ROUGHNESS EUV LITHOGRAPHY
- Publication number 20160379824
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Richard Wise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING
- Publication number 20160293418
- Publication date Oct 6, 2016
- Novellus Systems, Inc.
- Frank L. Pasquale
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMAGE REVERSAL WITH AHM GAP FILL FOR MULTIPLE PATTERNING
- Publication number 20160254171
- Publication date Sep 1, 2016
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD FILMS FOR EUV LITHOGRAPHY
- Publication number 20160179005
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING
- Publication number 20150126042
- Publication date May 7, 2015
- Novellus Systems, Inc.
- Frank L. Pasquale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD FILMS FOR EUV LITHOGRAPHY
- Publication number 20140239462
- Publication date Aug 28, 2014
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE REVERSAL WITH AHM GAP FILL FOR MULTIPLE PATTERNING
- Publication number 20140170853
- Publication date Jun 19, 2014
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement of thin film properties using plasmons
- Publication number 20050057754
- Publication date Mar 17, 2005
- David E. A. Smith
- G01 - MEASURING TESTING

Nader Shamma

Person

Patents Grantslast 30 patents

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Eliminating yield impact of stochastics in lithography

Method of controlling a patterning process, lithographic apparatus,...

Modification of SNO2 surface for EUV lithography

Eliminating yield impact of stochastics in lithography

Etching substrates using ALE and selective deposition

Tin oxide films in semiconductor device manufacturing

Low roughness EUV lithography

Etching substrates using ale and selective deposition

Soft landing nanolaminates for advanced patterning

Image reversal with AHM gap fill for multiple patterning

Low roughness EUV lithography

Soft landing nanolaminates for advanced patterning

PECVD films for EUV lithography

Soft landing nanolaminates for advanced patterning

Method for forming a mask by etching conformal film on patterned as...

PECVD films for EUV lithography

Patents Applicationslast 30 patents

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

MODIFICATION OF SNO2 SURFACE FOR EUV LITHOGRAPHY

ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

LOW ROUGHNESS EUV LITHOGRAPHY

SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING

ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

LOW ROUGHNESS EUV LITHOGRAPHY

SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING

IMAGE REVERSAL WITH AHM GAP FILL FOR MULTIPLE PATTERNING

PECVD FILMS FOR EUV LITHOGRAPHY

SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING

PECVD FILMS FOR EUV LITHOGRAPHY

IMAGE REVERSAL WITH AHM GAP FILL FOR MULTIPLE PATTERNING

Measurement of thin film properties using plasmons