Nadja SCHUH

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 10,908,496
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and contamination removal or prevention method
- Patent number 9,599,908
- Issue date Mar 21, 2017
- ASML Netherlands B.V.
- Anthonius Martinus Cornelis Petrus De Jong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and contamination removal or prevention method
- Patent number 9,158,206
- Issue date Oct 13, 2015
- ASML Netherlands B.V.
- Anthonius Martinus Cornelis Petrus De Jong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and contamination removal or prevention method
- Patent number 7,916,269
- Issue date Mar 29, 2011
- ASML Netherlands B.V.
- Anthonius Martinus Cornelis Petrus De Jong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20210109438
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
A MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20190129299
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich NASALEVICH
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
- Publication number 20160033875
- Publication date Feb 4, 2016
- ASML NETHERLANDS B.V.
- Anthonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
- Publication number 20110188013
- Publication date Aug 4, 2011
- ASML NETHERLANDS B.V.
- Anthonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus And Contamination Removal Or Prevention Method
- Publication number 20090025753
- Publication date Jan 29, 2009
- ASML NETHERLANDS B.V.
- Anthonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Contamination Removal or Prevention Method
- Publication number 20090027635
- Publication date Jan 29, 2009
- ASML NETHERLANDS B.V.
- Anthonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Nadja SCHUH

Person

Patents Grantslast 30 patents

Membrane for EUV lithography

Membrane for EUV lithography

Lithographic apparatus and contamination removal or prevention method

Lithographic apparatus and contamination removal or prevention method

Lithographic apparatus and contamination removal or prevention method

Patents Applicationslast 30 patents

MEMBRANE FOR EUV LITHOGRAPHY

MEMBRANE FOR EUV LITHOGRAPHY

A MEMBRANE FOR EUV LITHOGRAPHY

LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD

LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD

Lithographic Apparatus And Contamination Removal Or Prevention Method

Lithographic Apparatus and Contamination Removal or Prevention Method