Nagatoshi Fujieda

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Heat-resistant photosensitive resin composition, method for forming...
- Patent number 7,932,012
- Issue date Apr 26, 2011
- Hitachi Chemical DuPont Microsystems Ltd.
- Hiroshi Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, pattern forming method and electr...
- Patent number 7,642,018
- Issue date Jan 5, 2010
- Hitachi Chemical DuPont Microsystems, Ltd.
- Dai Kawasaki
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Heat-Resistant Photosensitive Resin Composition, Method For Forming...
- Publication number 20080233513
- Publication date Sep 25, 2008
- Hiroshi Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTR...
- Publication number 20070218400
- Publication date Sep 20, 2007
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Dai Kawasaki
- G11 - INFORMATION STORAGE