Nagesh Shirali

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,953,824
- Issue date Apr 9, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,693,306
- Issue date Jul 4, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,592,802
- Issue date Feb 28, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 10,884,395
- Issue date Jan 5, 2021
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240210815
- Publication date Jun 27, 2024
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230289510
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230288796
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20230205177
- Publication date Jun 29, 2023
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
- Publication number 20230186009
- Publication date Jun 15, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING A MACHINE-TRAINED NETWORK TO PERFORM PHYSICAL DESIGN
- Publication number 20230092665
- Publication date Mar 23, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230035090
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
- Publication number 20230032510
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230034170
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS TO DETERMINE PARASITICS FOR SEMICONDUCTOR OR FL...
- Publication number 20230027655
- Publication date Jan 26, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
- Publication number 20230024684
- Publication date Jan 26, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS TO DETERMINE SHAPES FOR SEMICONDUCTOR OR FLAT P...
- Publication number 20220128899
- Publication date Apr 28, 2022
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210208569
- Publication date Jul 8, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210116884
- Publication date Apr 22, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20200201286
- Publication date Jun 25, 2020
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING

Nagesh Shirali

Person

Patents Grantslast 30 patents

Method for reticle enhancement technology of a design pattern to be...

Method for reticle enhancement technology of a design pattern to be...

Method and system of reducing charged particle beam write time

Method for reticle enhancement technology of a design pattern to be...

Method and system for determining a charged particle beam exposure...

Method for reticle enhancement technology of a design pattern to be...

Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

USING A MACHINE-TRAINED NETWORK TO PERFORM PHYSICAL DESIGN

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHODS AND SYSTEMS TO DETERMINE PARASITICS FOR SEMICONDUCTOR OR FL...

COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS

METHODS AND SYSTEMS TO DETERMINE SHAPES FOR SEMICONDUCTOR OR FLAT P...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME