Nao Honda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hollow package and method for manufacturing same
- Patent number 11,955,394
- Issue date Apr 9, 2024
- Nippon Kayaku Kabushiki Kaisha
- Tadashi Naito
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polysulfonamide redistribution compositions and methods of their use
- Patent number 10,509,316
- Issue date Dec 17, 2019
- Daniel J Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, resist laminate, and cured produc...
- Patent number 10,241,408
- Issue date Mar 26, 2019
- Nippon Kayaku Kabushiki Kaisha
- Naoko Imaizumi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Photosensitive resin composition, resist laminate, and articles obt...
- Patent number 10,012,901
- Issue date Jul 3, 2018
- Nippon Kayaku Kabushiki Kaisha
- Naoko Imaizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, resist laminate, and cured produc...
- Patent number 9,684,239
- Issue date Jun 20, 2017
- Nippon Kayaku Kabushiki Kaisha
- Naoko Imaizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, resist laminate, and articles obt...
- Patent number 9,448,479
- Issue date Sep 20, 2016
- Nippon Kayaku Kabushiki Kaisha
- Naoko Imaizumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photosensitive resin composition and cured product of same
- Patent number 9,411,229
- Issue date Aug 9, 2016
- Nippon Kayaku Kabushiki Kaisha
- Shinya Inagaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and cured product thereof
- Patent number 9,223,212
- Issue date Dec 29, 2015
- Nippon Kayaku Kabushiki Kaisha
- Misato Oonishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and cured product thereof
- Patent number 8,865,392
- Issue date Oct 21, 2014
- Nippon Kayaku Kabushiki Kaisha
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for fabricating micromachine component of resin
- Patent number 8,481,248
- Issue date Jul 9, 2013
- TOHOKU UNIVERSITY
- Nao Honda
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photoresist compositions, hardened forms thereof, hardened patterns...
- Patent number 7,282,324
- Issue date Oct 16, 2007
- MicroChem Corp.
- William Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive Resin Composition And Cured Product Therefrom
- Publication number 20240168380
- Publication date May 23, 2024
- Nippon Kayaku Kabushiki-Kaisha
- Masahiro Tagami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hollow Package And Method For Manufacturing Same
- Publication number 20220068737
- Publication date Mar 3, 2022
- SUMITOMO BAKELITE CO., LTD.
- Tadashi Naito
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Polysulfonamide Redistribution Compositions and Methods of Their Use
- Publication number 20170329222
- Publication date Nov 16, 2017
- Daniel J. Nawrocki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photosensitive Resin Composition, Resist Laminate, And Articles Obt...
- Publication number 20150309409
- Publication date Oct 29, 2015
- NIPPON KAYAKU KABUSHIKI KAISHA
- Naoko Imaizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Resin Composition, Resist Laminate, And Cured Produc...
- Publication number 20150301450
- Publication date Oct 22, 2015
- NIPPON KAYAKU KABUSHIKI KAISHA
- Naoko Imaizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Resin Composition, Resist Laminate, And Cured Produc...
- Publication number 20150293448
- Publication date Oct 15, 2015
- NIPPON KAYAKU KABUSHIKI KAISHA
- Naoko Imaizumi
- B32 - LAYERED PRODUCTS
Information Patent Application
Photosensitive Resin Composition, Resist Laminate, And Articles Obt...
- Publication number 20150293444
- Publication date Oct 15, 2015
- NIPPON KAYAKU KABUSHIKI KAISHA
- Naoko Imaizumi
- B32 - LAYERED PRODUCTS
Information Patent Application
Photosensitive Resin Composition And Cured Product Thereof
- Publication number 20140186765
- Publication date Jul 3, 2014
- NIPPON KAYAKU KABUSHIKI KAISHA
- Misato Oonishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative Photosensitive Resin Composition And Cured Product Of Same
- Publication number 20140099581
- Publication date Apr 10, 2014
- NIPPON KAYAKU KABUSHIKI KAISHA
- Shinya Inagaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive Resin Composition And Cured Product Thereof
- Publication number 20130108961
- Publication date May 2, 2013
- NIPPON KAYAKU KABUSHIKI KAISHA
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Fabricating Micromachine Component of Resin
- Publication number 20090035706
- Publication date Feb 5, 2009
- Nao Honda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Permanent resist composition, cured product thereof, and use thereof
- Publication number 20050260522
- Publication date Nov 24, 2005
- William Weber
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist compositions, hardened forms thereof, hardened patterns...
- Publication number 20050147918
- Publication date Jul 7, 2005
- MicroChem Corp. a corporation of the state of Massachusetts, US
- William Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Hollow package and method for manufacturing same

Polysulfonamide redistribution compositions and methods of their use

Photosensitive resin composition, resist laminate, and cured produc...

Photosensitive resin composition, resist laminate, and articles obt...

Photosensitive resin composition, resist laminate, and cured produc...

Photosensitive resin composition, resist laminate, and articles obt...

Negative photosensitive resin composition and cured product of same

Photosensitive resin composition and cured product thereof

Photosensitive resin composition and cured product thereof

Method for fabricating micromachine component of resin

Photoresist compositions, hardened forms thereof, hardened patterns...

Patents Applicationslast 30 patents

Photosensitive Resin Composition And Cured Product Therefrom

Hollow Package And Method For Manufacturing Same

Polysulfonamide Redistribution Compositions and Methods of Their Use

Photosensitive Resin Composition, Resist Laminate, And Articles Obt...

Photosensitive Resin Composition, Resist Laminate, And Cured Produc...

Photosensitive Resin Composition, Resist Laminate, And Cured Produc...

Photosensitive Resin Composition, Resist Laminate, And Articles Obt...

Photosensitive Resin Composition And Cured Product Thereof

Negative Photosensitive Resin Composition And Cured Product Of Same

Photosensitive Resin Composition And Cured Product Thereof

Method for Fabricating Micromachine Component of Resin

Permanent resist composition, cured product thereof, and use thereof

Photoresist compositions, hardened forms thereof, hardened patterns...