Naohiko Okunishi

Person

  • Kurokawa-gun, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 11,908,664
    • Issue date Feb 20, 2024
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Filter device and plasma processing apparatus

    • Patent number 11,699,576
    • Issue date Jul 11, 2023
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Stage and plasma processing apparatus

    • Patent number 11,694,881
    • Issue date Jul 4, 2023
    • Tokyo Electron Limited
    • Hiroki Endo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 11,501,958
    • Issue date Nov 15, 2022
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Filter device and plasma processing apparatus

    • Patent number 11,495,443
    • Issue date Nov 8, 2022
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 11,456,160
    • Issue date Sep 27, 2022
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method

    • Patent number 11,145,490
    • Issue date Oct 12, 2021
    • Tokyo Electron Limited
    • Akihiro Yokota
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 11,037,762
    • Issue date Jun 15, 2021
    • Tokyo Electron Limited
    • Yohei Yamazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Filter device and plasma processing apparatus

    • Patent number 10,897,808
    • Issue date Jan 19, 2021
    • Tokyo Electron Limited
    • Nozomu Nagashima
    • H03 - BASIC ELECTRONIC CIRCUITRY
  • Information Patent Grant

    Stage and plasma processing apparatus

    • Patent number 10,886,109
    • Issue date Jan 5, 2021
    • Tokyo Electron Limited
    • Hiroki Endo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,763,087
    • Issue date Sep 1, 2020
    • Tokyo Electron Limited
    • Shuichi Takahashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate processing apparatus

    • Patent number 10,665,416
    • Issue date May 26, 2020
    • Tokyo Electron Limited
    • Shinji Kubota
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method for designing filter

    • Patent number 10,651,813
    • Issue date May 12, 2020
    • Tokyo Electron Limited
    • Nozomu Nagashima
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Plasma processing method

    • Patent number 10,546,723
    • Issue date Jan 28, 2020
    • Tokyo Electron Limited
    • Akihiro Yokota
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,332,728
    • Issue date Jun 25, 2019
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,096,454
    • Issue date Oct 9, 2018
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and filter unit

    • Patent number 10,074,519
    • Issue date Sep 11, 2018
    • Tokyo Electron Limited
    • Keiki Ito
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 9,754,766
    • Issue date Sep 5, 2017
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus, power supply unit and mounting table s...

    • Patent number 9,646,867
    • Issue date May 9, 2017
    • Tokyo Electron Limited
    • Masahiko Konno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and filter unit

    • Patent number 9,530,619
    • Issue date Dec 27, 2016
    • Tokyo Electron Limited
    • Naohiko Okunishi
    • H03 - BASIC ELECTRONIC CIRCUITRY
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 9,275,837
    • Issue date Mar 1, 2016
    • Tokyo Electron Limited
    • Yohei Yamazawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 8,398,815
    • Issue date Mar 19, 2013
    • Tokyo Electron Limited
    • Yohei Yamazawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20230057937
    • Publication date Feb 23, 2023
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILTER DEVICE AND PLASMA PROCESSING APPARATUS

    • Publication number 20230031368
    • Publication date Feb 2, 2023
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    STAGE AND PLASMA PROCESSING APPARATUS

    • Publication number 20210104386
    • Publication date Apr 8, 2021
    • TOKYO ELECTRON LIMITED
    • Hiroki ENDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD

    • Publication number 20200126759
    • Publication date Apr 23, 2020
    • TOKYO ELECTRON LIMITED
    • Akihiro YOKOTA
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS

    • Publication number 20200027688
    • Publication date Jan 23, 2020
    • TOKYO ELECTRON LIMITED
    • Shinji KUBOTA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILTER DEVICE AND PLASMA PROCESSING APPARATUS

    • Publication number 20190348263
    • Publication date Nov 14, 2019
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROCESSING APPARATUS AND METHOD FOR CONTROLLING PROCESSING APPARATUS

    • Publication number 20190318914
    • Publication date Oct 17, 2019
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20190295819
    • Publication date Sep 26, 2019
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD

    • Publication number 20190096635
    • Publication date Mar 28, 2019
    • TOKYO ELECTRON LIMITED
    • Akihiro YOKOTA
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20190096639
    • Publication date Mar 28, 2019
    • TOKYO ELECTRON LIMITED
    • Shuichi TAKAHASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20190027344
    • Publication date Jan 24, 2019
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    STAGE AND PLASMA PROCESSING APPARATUS

    • Publication number 20180350570
    • Publication date Dec 6, 2018
    • TOKYO ELECTRON LIMITED
    • Hiroki ENDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILTER DEVICE AND PLASMA PROCESSING APPARATUS

    • Publication number 20180309423
    • Publication date Oct 25, 2018
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H03 - BASIC ELECTRONIC CIRCUITRY
  • Information Patent Application

    FILTER DEVICE AND PLASMA PROCESSING APPARATUS

    • Publication number 20180139834
    • Publication date May 17, 2018
    • TOKYO ELECTRON LIMITED
    • Nozomu NAGASHIMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20180053635
    • Publication date Feb 22, 2018
    • TOKYO ELECTRON LIMITED
    • Yohei Yamazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR DESIGNING FILTER

    • Publication number 20170373659
    • Publication date Dec 28, 2017
    • TOKYO ELECTRON LIMITED
    • Nozomu NAGASHIMA
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20160126067
    • Publication date May 5, 2016
    • Tokyo Electron Limited
    • Naohiko OKUNISHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND FILTER UNIT

    • Publication number 20160079038
    • Publication date Mar 17, 2016
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20150262793
    • Publication date Sep 17, 2015
    • TOKYO ELECTRON LIMITED
    • Naohiko OKUNISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND FILTER UNIT

    • Publication number 20150235809
    • Publication date Aug 20, 2015
    • TOKYO ELECTRON LIMITED
    • Keiki Ito
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS, POWER SUPPLY UNIT AND MOUNTING TABLE S...

    • Publication number 20150109716
    • Publication date Apr 23, 2015
    • TOKYO ELECTRON LIMITED
    • Masahiko KONNO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20140110061
    • Publication date Apr 24, 2014
    • TOKYO ELECTRON LIMITED
    • Naohiko Okunishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20130340937
    • Publication date Dec 26, 2013
    • TOKYO ELECTRON LIMITED
    • Yohei Yamazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20110126765
    • Publication date Jun 2, 2011
    • TOKYO ELECTRON LIMITED
    • Yohei Yamazawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20100243609
    • Publication date Sep 30, 2010
    • TOKYO ELECTRON LIMITED
    • Yohei Yamazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20090133839
    • Publication date May 28, 2009
    • TOKYO ELECTRON LIMITED
    • Yohei YAMAZAWA
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR