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Naohiro Yamamoto

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  • Kudamatsu-shi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method
    • Patent number 9,972,776
    • Issue date May 15, 2018
    • Hitachi High-Technologies Corporations
    • Makoto Suyama
    • B08 - CLEANING
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,680,090
    • Issue date Jun 13, 2017
    • Hitachi High-Technologies Corporation
    • Daisuke Fujita
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,378,758
    • Issue date Jun 28, 2016
    • Hitachi High-Technologies Corporation
    • Takahiro Abe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing method
    • Patent number 9,281,470
    • Issue date Mar 8, 2016
    • Hitachi High-Technologies Corporation
    • Takahiro Abe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,269,892
    • Issue date Feb 23, 2016
    • Hitachi High-Technologies Corporation
    • Daisuke Fujita
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of manufacturing magnetoresistive element
    • Patent number 9,097,754
    • Issue date Aug 4, 2015
    • Hitachi High-Technologies Corporation
    • Makoto Satake
    • B82 - NANO-TECHNOLOGY
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,017,564
    • Issue date Apr 28, 2015
    • Hitachi High-Technologies Corporation
    • Atsushi Yoshida
    • G11 - INFORMATION STORAGE
  • Information Patent Grant

    Plasma etching method
    • Patent number 8,728,946
    • Issue date May 20, 2014
    • Hitachi High-Technologies Corporation
    • Takahiro Abe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20170194561
    • Publication date Jul 6, 2017
    • Hitachi High-Technologies Corporation
    • Makoto SUYAMA
    • B08 - CLEANING
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20160133834
    • Publication date May 12, 2016
    • Hitachi High-Technologies Corporation
    • Daisuke Fujita
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20150349245
    • Publication date Dec 3, 2015
    • Hitachi High-Technologies Corporation
    • Takahiro Abe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20150017741
    • Publication date Jan 15, 2015
    • Hitachi High-Technologies Corporation
    • Daisuke Fujita
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma Etching Method
    • Publication number 20140217061
    • Publication date Aug 7, 2014
    • Hitachi High-Technologies Corporation
    • Takahiro Abe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20140144873
    • Publication date May 29, 2014
    • Hitachi High-Technologies Corporation
    • Atsushi YOSHIDA
    • G11 - INFORMATION STORAGE
  • Information Patent Application

    METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT
    • Publication number 20140116985
    • Publication date May 1, 2014
    • Hitachi High-Technologies Corporation
    • Makoto SATAKE
    • B82 - NANO-TECHNOLOGY