Naohisa TAMADA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor laser and method for manufacturing the same
- Patent number 9,711,936
- Issue date Jul 18, 2017
- Mitsubishi Electric Corporation
- Masafumi Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of focus monitoring and manufacturing method for an electron...
- Patent number 6,890,692
- Issue date May 10, 2005
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern layout of a photomask for pattern transfer
- Patent number 6,869,735
- Issue date Mar 22, 2005
- Renesas Technology Corp.
- Naohisa Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus monitoring method, focus monitoring apparatus, and method of...
- Patent number 6,797,443
- Issue date Sep 28, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G02 - OPTICS
Information Patent Grant
Photomask for focus monitoring
- Patent number 6,764,794
- Issue date Jul 20, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shift mask and semiconductor device fabricated with the phase...
- Patent number 6,503,665
- Issue date Jan 7, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Naohisa Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device achieving higher integration, method of manufa...
- Patent number 6,395,456
- Issue date May 28, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Naohisa Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle, pattern transferred thereby, and correction method
- Patent number 5,868,560
- Issue date Feb 9, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Naohisa Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20170133820
- Publication date May 11, 2017
- Mitsubishi Electric Corporation
- Masafumi MINAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming alignment mark
- Publication number 20050064676
- Publication date Mar 24, 2005
- RENESAS TECHNOLOGY CORP.
- Akihiro Tobioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FO...
- Publication number 20040219441
- Publication date Nov 4, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of pattern layout of a photomask for pattern transfer
- Publication number 20040018434
- Publication date Jan 29, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Naohisa Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High-transmittance halftone phase shift mask and manufacturing meth...
- Publication number 20030203286
- Publication date Oct 30, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kiyoshi Maeshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask for focus monitoring, method of focus monitoring, unit fo...
- Publication number 20030073009
- Publication date Apr 17, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Focus monitoring method, focus monitoring apparatus, and method of...
- Publication number 20020195539
- Publication date Dec 26, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G02 - OPTICS

Naohisa TAMADA

Person

Patents Grantslast 30 patents

Semiconductor laser and method for manufacturing the same

Method of focus monitoring and manufacturing method for an electron...

Method of pattern layout of a photomask for pattern transfer

Focus monitoring method, focus monitoring apparatus, and method of...

Photomask for focus monitoring

Phase shift mask and semiconductor device fabricated with the phase...

Semiconductor device achieving higher integration, method of manufa...

Reticle, pattern transferred thereby, and correction method

Patents Applicationslast 30 patents

SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING THE SAME

Method of forming alignment mark

PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FO...

Method of pattern layout of a photomask for pattern transfer

High-transmittance halftone phase shift mask and manufacturing meth...

Photomask for focus monitoring, method of focus monitoring, unit fo...

Focus monitoring method, focus monitoring apparatus, and method of...