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Naoki Hirose

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  • Atsugi-shi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method for forming I-carbon film
    • Patent number 6,838,126
    • Issue date Jan 4, 2005
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electronic device and its manufacturing method
    • Patent number 6,756,670
    • Issue date Jun 29, 2004
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Microwave enhanced CVD method and apparatus
    • Patent number 6,677,001
    • Issue date Jan 13, 2004
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inujima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    CVD apparatus
    • Patent number 6,520,189
    • Issue date Feb 18, 2003
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 6,423,383
    • Issue date Jul 23, 2002
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 6,217,661
    • Issue date Apr 17, 2001
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electronic device including a densified region
    • Patent number 6,191,492
    • Issue date Feb 20, 2001
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    CVD apparatus
    • Patent number 6,013,338
    • Issue date Jan 11, 2000
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 5,858,259
    • Issue date Jan 12, 1999
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of forming a film on a substrate
    • Patent number 5,855,970
    • Issue date Jan 5, 1999
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 5,685,913
    • Issue date Nov 11, 1997
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method for forming a multi-layer planarization structure
    • Patent number 5,629,245
    • Issue date May 13, 1997
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    CVD apparatus
    • Patent number 5,427,824
    • Issue date Jun 27, 1995
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Apparatus for microwave processing in a magnetic field
    • Patent number 5,302,226
    • Issue date Apr 12, 1994
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method for manufacturing an electronic device
    • Patent number 5,225,367
    • Issue date Jul 6, 1993
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Microwave plasma etching and deposition method employing first and...
    • Patent number 5,203,959
    • Issue date Apr 20, 1993
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of manufacturing electric devices
    • Patent number 5,196,366
    • Issue date Mar 23, 1993
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Electric device utilizing antioxidation film between base pad for s...
    • Patent number 5,192,995
    • Issue date Mar 9, 1993
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunepi Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Photo CVD apparatus with a glow discharge system
    • Patent number 5,183,511
    • Issue date Feb 2, 1993
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing method for improving a package of a semiconductor...
    • Patent number 5,147,822
    • Issue date Sep 15, 1992
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Apparatus and method for forming thin films
    • Patent number 5,079,031
    • Issue date Jan 7, 1992
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electrophotographic photoconductor
    • Patent number 5,059,502
    • Issue date Oct 22, 1991
    • Ricoh Company, Ltd.
    • Narihito Kojima
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Plasma processing method and apparatus
    • Patent number 5,041,201
    • Issue date Aug 20, 1991
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma chemical vapor reaction method employing cyclotron resonance
    • Patent number 5,039,548
    • Issue date Aug 13, 1991
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of manufacturing a semiconductor using plasma processing
    • Patent number 5,013,688
    • Issue date May 7, 1991
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunepi Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus with a lisitano coil
    • Patent number 4,973,883
    • Issue date Nov 27, 1990
    • Semiconductor Energy Laborator Co., Ltd.
    • Naoki Hirose
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of depositing films using photo-CVD with chamber plasma clea...
    • Patent number 4,950,624
    • Issue date Aug 21, 1990
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inuzima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Gas discharge lamp having temperature controlled, liquid reservoir...
    • Patent number 4,949,004
    • Issue date Aug 14, 1990
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei Yamazaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Microwave plasma apparatus employing helmholtz coils and ioffe bars
    • Patent number 4,926,791
    • Issue date May 22, 1990
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Thin film manufacturing system
    • Patent number 4,887,548
    • Issue date Dec 19, 1989
    • Semiconductor Energy Laboratory Co., Ltd.
    • Kazuo Urata
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    Microwave enhanced CVD method and apparatus
    • Publication number 20050196549
    • Publication date Sep 8, 2005
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inujima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Plasma processing apparatus and method
    • Publication number 20050106331
    • Publication date May 19, 2005
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    CVD apparatus
    • Publication number 20030140941
    • Publication date Jul 31, 2003
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takashi Inushima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Plasma processing apparatus and method
    • Publication number 20030021910
    • Publication date Jan 30, 2003
    • Semiconductor Energy Laboratory Co., Ltd.
    • Naoki Hirose
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...