Naoki MATSUHASHI

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Phase shift mask blank, manufacturing method of phase shift mask, a...
- Patent number 12,197,121
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, method for producing phase shift mask, and...
- Patent number 11,422,456
- Issue date Aug 23, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, manufacturing method of photomask and photomask
- Patent number 11,402,744
- Issue date Aug 2, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and method of manufacturing photomask
- Patent number 11,131,920
- Issue date Sep 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for producing photomask
- Patent number 10,788,747
- Issue date Sep 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20230148427
- Publication date May 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK
- Publication number 20220317554
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK
- Publication number 20220229358
- Publication date Jul 21, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, MANUFACTURING METHOD OF PHASE SHIFT MASK, A...
- Publication number 20220137502
- Publication date May 5, 2022
- Shin-Etsu Chemical Co., Ltd.
- Shohei MIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, METHOD FOR PRODUCING PHASE SHIFT MASK, AND...
- Publication number 20220082929
- Publication date Mar 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20210173296
- Publication date Jun 10, 2021
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20200192215
- Publication date Jun 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK
- Publication number 20190146329
- Publication date May 16, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Naoki MATSUHASHI

Person

Patents Grantslast 30 patents

Phase shift mask blank, manufacturing method of phase shift mask, a...

Photomask blank, method for producing photomask, and photomask

Phase shift mask blank, method for producing phase shift mask, and...

Photomask blank, manufacturing method of photomask and photomask

Photomask blank, and method of manufacturing photomask

Photomask blank and method for producing photomask

Patents Applicationslast 30 patents

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK

PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK

PHASE SHIFT MASK BLANK, MANUFACTURING METHOD OF PHASE SHIFT MASK, A...

PHASE SHIFT MASK BLANK, METHOD FOR PRODUCING PHASE SHIFT MASK, AND...

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK

PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK