NAOKI MATSUMOTO

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NIRASAKI-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and high-frequency power application me...
- Patent number 12,027,347
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride composite substrate and method for manufacturing...
- Patent number 11,094,537
- Issue date Aug 17, 2021
- Sumitomo Electric Industries, Ltd.
- Keiji Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing silicon carbide substrate, method for manu...
- Patent number 11,034,058
- Issue date Jun 15, 2021
- Sumitomo Electric Industries, Ltd.
- Naoki Matsumoto
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Antenna device, radiation method of electromagnetic waves, plasma p...
- Patent number 10,896,811
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Ayako Ito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus
- Patent number 10,847,341
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna, plasma processing device and plasma processing method
- Patent number 10,832,892
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Kazuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,804,072
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave control method
- Patent number 10,679,826
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,665,428
- Issue date May 26, 2020
- Tokyo Electron Limited
- Michitaka Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,622,197
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride composite substrate and method for manufacturing...
- Patent number 10,600,676
- Issue date Mar 24, 2020
- Sumitomo Electric Industries, Ltd.
- Keiji Ishibashi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Antenna device and plasma processing apparatus
- Patent number 10,553,402
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus and method for usin...
- Patent number 10,529,596
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,504,698
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,438,819
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,312,057
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma etching apparatus
- Patent number 10,224,220
- Issue date Mar 5, 2019
- Tokyo Electron Limited
- Toshihisa Ozu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Group III nitride composite substrate and method for manufacturing...
- Patent number 10,186,451
- Issue date Jan 22, 2019
- Sumitomo Electric Industries, Ltd.
- Akihiro Hachigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,144,040
- Issue date Dec 4, 2018
- Tokyo Electron Limited
- Wataru Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antenna and plasma processing apparatus
- Patent number 10,083,819
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,062,547
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Naoki Mihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and plasma processing method
- Patent number 9,984,906
- Issue date May 29, 2018
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride composite substrate and method for manufacturing...
- Patent number 9,917,004
- Issue date Mar 13, 2018
- Sumitomo Electric Industries, Ltd.
- Keiji Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,805,959
- Issue date Oct 31, 2017
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,761,418
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Masayuki Shintaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,659,754
- Issue date May 23, 2017
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...
- Publication number 20240297054
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING SYSTEM GROUP
- Publication number 20240222969
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222075
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071734
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240055235
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030012
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEASONING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030014
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM
- Publication number 20230402263
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SILICON CARBIDE SUBSTRATE, SILICON CARBIDE...
- Publication number 20230369411
- Publication date Nov 16, 2023
- Sumitomo Electric Industries, Ltd.
- Takashi SAKURADA
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA PROCESSING APPARATUS AND HIGH-FREQUENCY POWER APPLICATION ME...
- Publication number 20220076928
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SILICON CARBIDE SUBSTRATE, METHOD FOR MANU...
- Publication number 20210060818
- Publication date Mar 4, 2021
- Sumitomo Electric Industries, Ltd.
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210027980
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III NITRIDE COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING...
- Publication number 20200176305
- Publication date Jun 4, 2020
- Sumitomo Electric Industries, Ltd.
- Keiji ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA DEVICE, RADIATION METHOD OF ELECTROMAGNETIC WAVES, PLASMA P...
- Publication number 20200075292
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Ayako ITO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20200058468
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Kazuki TAKAHASHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190333736
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Yuki KAWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190279845
- Publication date Sep 12, 2019
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180294137
- Publication date Oct 11, 2018
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180211818
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III NITRIDE COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING...
- Publication number 20180166325
- Publication date Jun 14, 2018
- Sumitomo Electric Industries, Ltd.
- Keiji ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180151332
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180025923
- Publication date Jan 25, 2018
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE CONTROL METHOD
- Publication number 20180019103
- Publication date Jan 18, 2018
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170229286
- Publication date Aug 10, 2017
- TOKYO ELECTRON LIMITED
- Michitaka AITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...
- Publication number 20170162406
- Publication date Jun 8, 2017
- TOKYO ELECTRON LIMITED
- NAOKI MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS

NAOKI MATSUMOTO

Person

Patents Grantslast 30 patents

Plasma processing apparatus and high-frequency power application me...

Plasma processing apparatus

Group III nitride composite substrate and method for manufacturing...

Method for manufacturing silicon carbide substrate, method for manu...

Antenna device, radiation method of electromagnetic waves, plasma p...

Plasma processing apparatus and method

Plasma processing apparatus

Antenna, plasma processing device and plasma processing method

Plasma processing apparatus

Microwave control method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Group III nitride composite substrate and method for manufacturing...

Antenna device and plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Capacitive coupling plasma processing apparatus and method for usin...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma etching apparatus

Group III nitride composite substrate and method for manufacturing...

Plasma processing method and plasma processing apparatus

Antenna and plasma processing apparatus

Plasma processing apparatus

Plasma processing device and plasma processing method

Group III nitride composite substrate and method for manufacturing...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

POWER SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING SYSTEM GROUP

PLASMA PROCESSING APPARATUS

LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

DETECTION METHOD AND PLASMA PROCESSING APPARATUS

SEASONING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM

METHOD OF MANUFACTURING SILICON CARBIDE SUBSTRATE, SILICON CARBIDE...

PLASMA PROCESSING APPARATUS AND HIGH-FREQUENCY POWER APPLICATION ME...

PLASMA PROCESSING APPARATUS AND METHOD

METHOD FOR MANUFACTURING SILICON CARBIDE SUBSTRATE, METHOD FOR MANU...

PLASMA PROCESSING APPARATUS

GROUP III NITRIDE COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING...

PLASMA PROCESSING APPARATUS AND METHOD

ANTENNA DEVICE, RADIATION METHOD OF ELECTROMAGNETIC WAVES, PLASMA P...

ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GROUP III NITRIDE COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MICROWAVE CONTROL METHOD

PLASMA PROCESSING APPARATUS

CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD