Naoki Mihara

Person

Sendai, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mounting state informing apparatus and mounting state informing method
- Patent number 11,543,807
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Naoto Hayasaka
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus for performing plasma process for targe...
- Patent number 10,319,568
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Ippei Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,312,057
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,062,547
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Naoki Mihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,324,542
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 9,111,726
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric window for plasma treatment device, and plasma treatment...
- Patent number 9,048,070
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,920,596
- Issue date Dec 30, 2014
- Tokyo Electron Limited
- Naoki Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and gas supply member support device
- Patent number 8,663,424
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- Naoki Mihara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...
- Publication number 20240297054
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071734
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240055235
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING STATE INFORMING APPARATUS AND MOUNTING STATE INFORMING METHOD
- Publication number 20200117175
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Naoto Hayasaka
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126114
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150294839
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228459
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20150155139
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150129129
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Ippei SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140338602
- Publication date Nov 20, 2014
- Naoki MIHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...
- Publication number 20140312767
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
- Publication number 20130302992
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120267048
- Publication date Oct 25, 2012
- TOKYO ELECTRON LIMITED
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120241090
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS SUPPLY MEMBER SUPPORT DEVICE
- Publication number 20110308733
- Publication date Dec 22, 2011
- TOKYO ELECTRON LIMITED
- Naoki Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...
- Publication number 20110186226
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Kenji Sudou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110048642
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Naoki MIHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Naoki Mihara

Person

Patents Grantslast 30 patents

Mounting state informing apparatus and mounting state informing method

Plasma processing apparatus for performing plasma process for targe...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Apparatus for plasma treatment and method for plasma treatment

Plasma processing apparatus

Dielectric window for plasma treatment device, and plasma treatment...

Plasma processing apparatus

Plasma processing apparatus and gas supply member support device

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MOUNTING STATE INFORMING APPARATUS AND MOUNTING STATE INFORMING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND GAS SUPPLY MEMBER SUPPORT DEVICE

GAS SUPPLY MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...

PLASMA PROCESSING APPARATUS