Naoki Nishiguchi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor treatment composition and treatment method
- Patent number 10,319,605
- Issue date Jun 11, 2019
- JSR Corporation
- Yasutaka Kamei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor treatment composition and treatment method
- Patent number 10,304,694
- Issue date May 28, 2019
- JSR Corporation
- Takahiro Hayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a synchronous motor
- Patent number 6,344,725
- Issue date Feb 5, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Toshiyuki Kaitani
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20230036031
- Publication date Feb 2, 2023
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20220057714
- Publication date Feb 24, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PLATED FORMED PRODUCT
- Publication number 20220035246
- Publication date Feb 3, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210325783
- Publication date Oct 21, 2021
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210311391
- Publication date Oct 7, 2021
- JSR Corporation
- Takuhiro TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR TREATMENT COMPOSITION
- Publication number 20190122896
- Publication date Apr 25, 2019
- JSR Corporation
- Takahiro HAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD
- Publication number 20180226267
- Publication date Aug 9, 2018
- JSR Corporation
- Takahiro HAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL M...
- Publication number 20180086943
- Publication date Mar 29, 2018
- JSR Corporation
- Takahiro HAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD
- Publication number 20170330763
- Publication date Nov 16, 2017
- JSR Corporation
- Yasutaka KAMEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD
- Publication number 20170330762
- Publication date Nov 16, 2017
- JSR Corporation
- Yasutaka KAMEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND CHEMICAL MECHANICAL P...
- Publication number 20130331004
- Publication date Dec 12, 2013
- Gaku MINAMIHABA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...
- Publication number 20130316621
- Publication date Nov 28, 2013
- JSR Corporation
- Ayako Maekawa
- B24 - GRINDING POLISHING
Information Patent Application
PAD FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF CHEMICAL MECHAN...
- Publication number 20120322348
- Publication date Dec 20, 2012
- JSR Corporation
- Katsutaka Yokoi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method and apparatus for controlling a synchronous motor
- Publication number 20010048283
- Publication date Dec 6, 2001
- Toshiyuki Kaitani
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Naoki Nishiguchi

Person

Patents Grantslast 30 patents

Photosensitive resin composition, method for forming resist pattern...

Semiconductor treatment composition and treatment method

Semiconductor treatment composition and treatment method

Method and apparatus for controlling a synchronous motor

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

METHOD FOR PRODUCING PLATED FORMED PRODUCT

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

SEMICONDUCTOR TREATMENT COMPOSITION

SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD

TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL M...

SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD

SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND CHEMICAL MECHANICAL P...

CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...

PAD FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF CHEMICAL MECHAN...

Method and apparatus for controlling a synchronous motor