Naoki Shimohakamada

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PH...
- Patent number 6,821,683
- Issue date Nov 23, 2004
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for making photomask pattern data and photomask
- Patent number 6,560,767
- Issue date May 6, 2003
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for correcting design pattern of semiconductor circuit, a ph...
- Publication number 20020110742
- Publication date Aug 15, 2002
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for making photomask pattern data and photomask
- Publication number 20020028523
- Publication date Mar 7, 2002
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY