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Naoki SHIMOMURA
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plating method, insoluble anode for plating, and plating apparatus
Patent number
12,157,951
Issue date
Dec 3, 2024
Ebara Corporation
Hiroyuki Kanda
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Plating apparatus
Patent number
11,725,297
Issue date
Aug 15, 2023
Ebara Corporation
Naoki Shimomura
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Regulation plate, anode holder, and substrate holder
Patent number
11,686,009
Issue date
Jun 27, 2023
Ebara Corporation
Naoki Shimomura
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Substrate holder and plating device
Patent number
11,280,020
Issue date
Mar 22, 2022
Ebara Corporation
Naoki Shimomura
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Regulation plate, anode holder, and substrate holder
Patent number
11,268,207
Issue date
Mar 8, 2022
Ebara Corporation
Naoki Shimomura
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Plating apparatus and plating method
Patent number
11,066,755
Issue date
Jul 20, 2021
Ebara Corporation
Naoki Shimomura
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLATING METHOD, INSOLUBLE ANODE FOR PLATING, AND PLATING APPARATUS
Publication number
20220228285
Publication date
Jul 21, 2022
EBARA CORPORATION
Hiroyuki Kanda
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
REGULATION PLATE, ANODE HOLDER, AND SUBSTRATE HOLDER
Publication number
20220154363
Publication date
May 19, 2022
EBARA CORPORATION
Naoki SHIMOMURA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PLATING APPARATUS
Publication number
20220119981
Publication date
Apr 21, 2022
EBARA CORPORATION
Naoki Shimomura
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PLATING METHOD, PLATING APPARATUS, ANODE HOLDER
Publication number
20210071312
Publication date
Mar 11, 2021
EBARA CORPORATION
Naoki SHIMOMURA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
SUBSTRATE HOLDER AND PLATING DEVICE
Publication number
20210054521
Publication date
Feb 25, 2021
EBARA CORPORATION
Naoki SHIMOMURA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
REGULATION PLATE, ANODE HOLDER, AND SUBSTRATE HOLDER
Publication number
20200157702
Publication date
May 21, 2020
EBARA CORPORATION
Naoki SHIMOMURA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PLATING APPARATUS AND PLATING METHOD
Publication number
20190390360
Publication date
Dec 26, 2019
EBARA CORPORATION
Naoki SHIMOMURA
H01 - BASIC ELECTRIC ELEMENTS