Naoki Yasui

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,978,612
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,105
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,501
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,355,315
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 11,152,192
- Issue date Oct 19, 2021
- HITACHI HIGH-TECH CORPORATION
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,094,512
- Issue date Aug 17, 2021
- HITACHI HIGH-TECH CORPORATION
- Kazuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and ECR heig...
- Patent number 11,081,320
- Issue date Aug 3, 2021
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,004,658
- Issue date May 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,755,897
- Issue date Aug 25, 2020
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,699,884
- Issue date Jun 30, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,665,516
- Issue date May 26, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,622,269
- Issue date Apr 14, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,460,913
- Issue date Oct 29, 2019
- Hitachi High-Technologies Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,217,613
- Issue date Feb 26, 2019
- Hitachi High-Technologies Corporation
- Tetsuo Kawanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,192,718
- Issue date Jan 29, 2019
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,037,868
- Issue date Jul 31, 2018
- Hitachi High-Technologies Corporation
- Koji Toyota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,741,579
- Issue date Aug 22, 2017
- Hitachi High-Technologies Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,502,217
- Issue date Nov 22, 2016
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sample processing apparatus, sample processing system, and method f...
- Patent number 9,390,941
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,336,999
- Issue date May 10, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,992,724
- Issue date Mar 31, 2015
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,497,213
- Issue date Jul 30, 2013
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,142,674
- Issue date Mar 27, 2012
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,075,733
- Issue date Dec 13, 2011
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,807,581
- Issue date Oct 5, 2010
- Hitachi High-Technologies Corporation
- Susumu Tauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus having high frequency power source with...
- Patent number 7,615,132
- Issue date Nov 10, 2009
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus using active matching
- Patent number 7,373,899
- Issue date May 20, 2008
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,169,255
- Issue date Jan 30, 2007
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,029,594
- Issue date Apr 18, 2006
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240331974
- Publication date Oct 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230058692
- Publication date Feb 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210398777
- Publication date Dec 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210043424
- Publication date Feb 11, 2021
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...
- Publication number 20200286715
- Publication date Sep 10, 2020
- Hitachi High-Technologies Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200279719
- Publication date Sep 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuya YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190237300
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20190115193
- Publication date Apr 18, 2019
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190088452
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Kazuya YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190088453
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Yasushi SONODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190006153
- Publication date Jan 3, 2019
- Hitachi High-Technologies Corporation
- Nanako TAMARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180337022
- Publication date Nov 22, 2018
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180277402
- Publication date Sep 27, 2018
- Hitachi High-Technologies Corporation
- Masatoshi KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180269118
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180082821
- Publication date Mar 22, 2018
- Hitachi High-Technologies Corporation
- Norihiko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR
- Publication number 20170186587
- Publication date Jun 29, 2017
- Hitachi High-Technologies Corporation
- Tetsuo KAWANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170092468
- Publication date Mar 30, 2017
- Hitachi High-Technologies Corporation
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160254163
- Publication date Sep 1, 2016
- Hitachi High-Technologies Corporation
- Nanako TAMARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160233057
- Publication date Aug 11, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150279624
- Publication date Oct 1, 2015
- Hitachi High-Technologies Corporation
- Koji Toyota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150170886
- Publication date Jun 18, 2015
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20150144594
- Publication date May 28, 2015
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140363977
- Publication date Dec 11, 2014
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS
- Publication number 20140220489
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Yutaka KOZUMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140148016
- Publication date May 29, 2014
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140011365
- Publication date Jan 9, 2014
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...
- Publication number 20120228261
- Publication date Sep 13, 2012
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20120145323
- Publication date Jun 14, 2012
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100043976
- Publication date Feb 25, 2010
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20090194506
- Publication date Aug 6, 2009
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Naoki Yasui

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, plasma processing method, and ECR heig...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Etching method and plasma processing apparatus

Etching method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Sample processing apparatus, sample processing system, and method f...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus having high frequency power source with...

Plasma processing apparatus using active matching

Plasma processing apparatus

Plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

THE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Apparatus and Plasma Processing Method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...

Plasma Processing Apparatus and Plasma Processing Method

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus And Plasma Processing Method