Naoko Matsui

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and device manufacturing method
- Patent number 10,685,815
- Issue date Jun 16, 2020
- Canon Anelva Corporation
- Ryo Matsuhashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of magneto-resistance effect element
- Patent number 8,465,990
- Issue date Jun 18, 2013
- Canon Anelva Corporation
- Naoko Matsui
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120145671
- Publication date Jun 14, 2012
- Canon ANELVA Corporation
- Ryo Matsuhashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF MAGNETO-RESISTANCE EFFECT ELEMENT
- Publication number 20110256642
- Publication date Oct 20, 2011
- Canon ANELVA Corporation
- Naoko Matsui
- G01 - MEASURING TESTING
Information Patent Application
DRY ETCHING METHOD, MAGNETO-RESISTIVE ELEMENT, AND METHOD AND APPAR...
- Publication number 20100310902
- Publication date Dec 9, 2010
- Canon ANELVA Corporation
- Tomoaki Osada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...