Naomichi Abe

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of stripping a resist mask
- Patent number 5,998,104
- Issue date Dec 7, 1999
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing organic resist from semiconductor
- Patent number 5,961,775
- Issue date Oct 5, 1999
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of stripping a resist mask
- Patent number 5,773,201
- Issue date Jun 30, 1998
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of resist patterns
- Patent number 5,194,364
- Issue date Mar 16, 1993
- Fujitsu Limited
- Naomichi Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of a negative resist pattern utilize water-soluble polyme...
- Patent number 5,017,461
- Issue date May 21, 1991
- Fujitsu Limited
- Naomichi Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY