Naotaka Kubota

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electro-optical device and electronic apparatus
- Patent number 11,495,774
- Issue date Nov 8, 2022
- Seiko Epson Corporation
- Yoshitaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, diagnostic test, and diagnostic test circuit
- Patent number 10,520,549
- Issue date Dec 31, 2019
- Renesas Electronics Corporation
- Yukitoshi Tsuboi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electro-optical device, method for manufacturing electro-optical de...
- Patent number 10,403,687
- Issue date Sep 3, 2019
- Seiko Epson Corporation
- Suguru Akagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrooptical device, manufacturing method of electrooptical devic...
- Patent number 10,347,698
- Issue date Jul 9, 2019
- Seiko Epson Corporation
- Naotaka Kubota
- G02 - OPTICS
Information Patent Grant
Electro-optical device, method for manufacturing electro-optical de...
- Patent number 10,163,986
- Issue date Dec 25, 2018
- Seiko Epson Corporation
- Takefumi Fukagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electro-optical device and electronic apparatus having an evaluatio...
- Patent number 10,153,330
- Issue date Dec 11, 2018
- Seiko Epson Corporation
- Naotaka Kubota
- G02 - OPTICS
Information Patent Grant
Organic EL device, method of manufacturing organic EL device, and e...
- Patent number 10,090,364
- Issue date Oct 2, 2018
- Seiko Epson Corporation
- Suguru Akagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, diagnostic test, and diagnostic test circuit
- Patent number 9,810,738
- Issue date Nov 7, 2017
- Renesas Electronics Corporation
- Yukitoshi Tsuboi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Color filter substrate, electro-optical device, and projection-type...
- Patent number 9,671,640
- Issue date Jun 6, 2017
- Seiko Epson Corporation
- Reiko Wachi
- G02 - OPTICS
Information Patent Grant
Light emitting element disposed in a display region of a substrate
- Patent number 9,666,646
- Issue date May 30, 2017
- Seiko Epson Corporation
- Takashi Toya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Color filter substrate, electro-optical device, and projection-type...
- Patent number 9,618,786
- Issue date Apr 11, 2017
- Seiko Epson Corporation
- Reiko Wachi
- G02 - OPTICS
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,293,449
- Issue date Oct 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,723,007
- Issue date May 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,501,221
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,435,530
- Issue date Oct 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,390,612
- Issue date Jun 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,326,515
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,323,287
- Issue date Jan 29, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming resist pattern, positive resist composition, and...
- Patent number 7,316,885
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,888
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,889
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid coating composition for forming a top antireflective film an...
- Patent number 7,129,020
- Issue date Oct 31, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern fr...
- Patent number 7,074,543
- Issue date Jul 11, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 7,033,731
- Issue date Apr 25, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,864,036
- Issue date Mar 8, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 6,455,228
- Issue date Sep 24, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for lithographic anti-reflection coating, and resist la...
- Patent number 6,416,930
- Issue date Jul 9, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,406,829
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
- Publication number 20210225959
- Publication date Jul 22, 2021
- SEIKO EPSON CORPORATION
- Yoshitaka HAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT-EMITTING DEVICE, AND ELECTRONIC APPARATUS
- Publication number 20210028246
- Publication date Jan 28, 2021
- SEIKO EPSON CORPORATION
- Naotaka KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROOPTICAL DEVICE, MANUFACTURING METHOD OF ELECTROOPTICAL DEVIC...
- Publication number 20180277610
- Publication date Sep 27, 2018
- SEIKO EPSON CORPORATION
- Naotaka KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRO-OPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DE...
- Publication number 20180138245
- Publication date May 17, 2018
- SEIKO EPSON CORPORATION
- Suguru AKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRO-OPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DE...
- Publication number 20180138244
- Publication date May 17, 2018
- SEIKO EPSON CORPORATION
- Takefumi FUKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, DIAGNOSTIC TEST, AND DIAGNOSTIC TEST CIRCUIT
- Publication number 20180080984
- Publication date Mar 22, 2018
- RENESAS ELECTRONICS CORPORATION
- Yukitoshi TSUBOI
- G01 - MEASURING TESTING
Information Patent Application
ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
- Publication number 20170236879
- Publication date Aug 17, 2017
- SEIKO EPSON CORPORATION
- Naotaka KUBOTA
- G02 - OPTICS
Information Patent Application
ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
- Publication number 20170236880
- Publication date Aug 17, 2017
- SEIKO EPSON CORPORATION
- Naotaka KUBOTA
- G02 - OPTICS
Information Patent Application
ORGANIC EL DEVICE, METHOD OF MANUFACTURING ORGANIC EL DEVICE, AND E...
- Publication number 20170005144
- Publication date Jan 5, 2017
- SEIKO EPSON CORPORATION
- Suguru AKAGAWA
- G02 - OPTICS
Information Patent Application
COLOR FILTER SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND PROJECTION-TYPE...
- Publication number 20160170260
- Publication date Jun 16, 2016
- SEIKO EPSON CORPORATION
- Reiko Wachi
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR DEVICE, DIAGNOSTIC TEST, AND DIAGNOSTIC TEST CIRCUIT
- Publication number 20150293173
- Publication date Oct 15, 2015
- RENESAS ELECTRONICS CORPORATION
- Yukitoshi TSUBOI
- G01 - MEASURING TESTING
Information Patent Application
LIGHT-EMITTING DEVICE AND ELECTRONIC APPARATUS
- Publication number 20150102376
- Publication date Apr 16, 2015
- SEIKO EPSON CORPORATION
- Takashi TOYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polymer Compound, Photoresist Composition Including the Polymer Com...
- Publication number 20080166655
- Publication date Jul 10, 2008
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...
- Publication number 20070190455
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming resist pattern, positive resist composition, and...
- Publication number 20060154181
- Publication date Jul 13, 2006
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134553
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134552
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127807
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming resist pattern and resist pattern
- Publication number 20060127799
- Publication date Jun 15, 2006
- Naotaka Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127806
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127808
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20060063102
- Publication date Mar 23, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Naotaka Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing (meth) acrylic acid derivative polymer for resist
- Publication number 20060009583
- Publication date Jan 12, 2006
- Naotaka Kubota
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20050095535
- Publication date May 5, 2005
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20050008972
- Publication date Jan 13, 2005
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern fr...
- Publication number 20040110085
- Publication date Jun 10, 2004
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20040058270
- Publication date Mar 25, 2004
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid coating composition for forming a top antireflective film an...
- Publication number 20030219682
- Publication date Nov 27, 2003
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20020146645
- Publication date Oct 10, 2002
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoresist composition
- Publication number 20020061467
- Publication date May 23, 2002
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Naotaka Kubota

Person

Patents Grantslast 30 patents

Electro-optical device and electronic apparatus

Semiconductor device, diagnostic test, and diagnostic test circuit

Electro-optical device, method for manufacturing electro-optical de...

Electrooptical device, manufacturing method of electrooptical devic...

Electro-optical device, method for manufacturing electro-optical de...

Electro-optical device and electronic apparatus having an evaluatio...

Organic EL device, method of manufacturing organic EL device, and e...

Semiconductor device, diagnostic test, and diagnostic test circuit

Color filter substrate, electro-optical device, and projection-type...

Light emitting element disposed in a display region of a substrate

Color filter substrate, electro-optical device, and projection-type...

Positive resist composition and method of forming resist pattern

Polymer compound, photoresist composition including the polymer com...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Method of forming resist pattern, positive resist composition, and...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Liquid coating composition for forming a top antireflective film an...

Positive resist composition and method of forming resist pattern fr...

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Multilayered body for photolithographic patterning

Composition for lithographic anti-reflection coating, and resist la...

Negative-working photoresist composition

Patents Applicationslast 30 patents

ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS

LIGHT-EMITTING DEVICE, AND ELECTRONIC APPARATUS

ELECTROOPTICAL DEVICE, MANUFACTURING METHOD OF ELECTROOPTICAL DEVIC...

ELECTRO-OPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DE...

ELECTRO-OPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DE...

SEMICONDUCTOR DEVICE, DIAGNOSTIC TEST, AND DIAGNOSTIC TEST CIRCUIT

ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS

ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS

ORGANIC EL DEVICE, METHOD OF MANUFACTURING ORGANIC EL DEVICE, AND E...

COLOR FILTER SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND PROJECTION-TYPE...

SEMICONDUCTOR DEVICE, DIAGNOSTIC TEST, AND DIAGNOSTIC TEST CIRCUIT

LIGHT-EMITTING DEVICE AND ELECTRONIC APPARATUS

Polymer Compound, Photoresist Composition Including the Polymer Com...

POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...

Method of forming resist pattern, positive resist composition, and...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Method for forming resist pattern and resist pattern

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive resist composition

Method of producing (meth) acrylic acid derivative polymer for resist

Positive type resist composition and resist pattern formation metho...

Multilayered body for photolithographic patterning

Positive resist composition and method of forming resist pattern fr...

Positive resist composition and method of forming resist pattern

Liquid coating composition for forming a top antireflective film an...

Multilayered body for photolithographic patterning

Negative-working photoresist composition