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Boise, ID, US
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Patents Grants
last 30 patents
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Patent Grant
Method for forming RuSi film and substrate processing system
Patent number
11,981,992
Issue date
May 14, 2024
Tokyo Electron Limited
Tadahiro Ishizaka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Etching method
Patent number
11,721,557
Issue date
Aug 8, 2023
Tokyo Electron Limited
Tadashi Mitsunari
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
FILM-FORMING METHOD, FILM-FORMING APPARATUS, AND OXIDATION METHOD
Publication number
20220068637
Publication date
Mar 3, 2022
Tokyo Electron Limited
Kotaro MIYATANI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ETCHING METHOD
Publication number
20210351040
Publication date
Nov 11, 2021
Tadashi MITSUNARI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
Publication number
20210301402
Publication date
Sep 30, 2021
TOKYO ELECTRON LIMITED
Yusuke SUZUKI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR FORMING RuSi FILM AND SUBSTRATE PROCESSING SYSTEM
Publication number
20210017642
Publication date
Jan 21, 2021
TOKYO ELECTRON LIMITED
Tadahiro ISHIZAKA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of Forming RuSi Film and Film and Film-Forming Apparatus
Publication number
20200208260
Publication date
Jul 2, 2020
TOKYO ELECTRON LIMITED
Takamichi KIKUCHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...