Naoto Motoike

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming pattern
- Patent number 9,459,535
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,274,424
- Issue date Mar 1, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,235,123
- Issue date Jan 12, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,945,812
- Issue date Feb 3, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,367,299
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,283,105
- Issue date Oct 9, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiko Kakinoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,257,904
- Issue date Sep 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,252,509
- Issue date Aug 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,206,890
- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,629,105
- Issue date Dec 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20200192223
- Publication date Jun 18, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto MOTOIKE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20140287362
- Publication date Sep 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20140287361
- Publication date Sep 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130244176
- Publication date Sep 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130209941
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20120009521
- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110117491
- Publication date May 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100233624
- Publication date Sep 16, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiko Kakinoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100136480
- Publication date Jun 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20100015552
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20090311625
- Publication date Dec 17, 2009
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20080227027
- Publication date Sep 18, 2008
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20070141514
- Publication date Jun 21, 2007
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060210916
- Publication date Sep 21, 2006
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20050266346
- Publication date Dec 1, 2005
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical-amplification positive-working photoresist composition
- Publication number 20050170276
- Publication date Aug 4, 2005
- TOKYO OHKA KOGYO CO., LTD.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20040248033
- Publication date Dec 9, 2004
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20030129534
- Publication date Jul 10, 2003
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Naoto Motoike

Person

Patents Grantslast 30 patents

Method of forming pattern

Resist composition and resist pattern forming method

Resist composition and resist pattern forming method

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound and...

Positive resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound and...

Positive photoresist composition and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

Method for forming photoresist pattern and photoresist laminate

Method for forming photoresist pattern and photoresist laminate

Method for forming photoresist pattern and photoresist laminate

Positive photoresist composition and method of forming resist pattern

Method for forming photoresist pattern and photoresist laminate

Chemical-amplification positive-working photoresist composition

Method for forming photoresist pattern and photoresist laminate

Method for forming photoresist pattern and photoresist laminate