Naoto Nakamura

Person

Toyama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device producing method, substrate producing method a...
- Patent number 8,268,731
- Issue date Sep 18, 2012
- Hitatchi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treating apparatus
- Patent number 7,865,070
- Issue date Jan 4, 2011
- Hitachi Kokusai Electric Inc.
- Iwao Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal treatment apparatus, method for manufacturing semiconductor...
- Patent number 7,667,301
- Issue date Feb 23, 2010
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING FILM AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20120052657
- Publication date Mar 1, 2012
- Hitachi Kokusai Electric Inc.
- Tomoshi TANIYAMA
- C30 - CRYSTAL GROWTH
Information Patent Application
Thermal treatment apparatus, method for manufacturing semiconductor...
- Publication number 20100148415
- Publication date Jun 17, 2010
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Producing Method, Substrate Producing Method a...
- Publication number 20100029092
- Publication date Feb 4, 2010
- HITACHI KIKUSAI ELECTRIC INC.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal treatment apparatus, method for manufacturing semiconductor...
- Publication number 20090186489
- Publication date Jul 23, 2009
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of a semiconductor device and substrate cleani...
- Publication number 20080295868
- Publication date Dec 4, 2008
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat Treating Apparatus
- Publication number 20080267598
- Publication date Oct 30, 2008
- Hitachi Kokusai Electric Inc.
- Iwao Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat Treatment Apparatus
- Publication number 20070275570
- Publication date Nov 29, 2007
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal Treatment Apparatus, Method For Manufacturing Semiconductor...
- Publication number 20070194411
- Publication date Aug 23, 2007
- Hitachi Kokusai Electric Inc.
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS

Naoto Nakamura

Person

Patents Grantslast 30 patents

Semiconductor device producing method, substrate producing method a...

Heat treating apparatus

Thermal treatment apparatus, method for manufacturing semiconductor...

Patents Applicationslast 30 patents

METHOD OF FORMING FILM AND SUBSTRATE PROCESSING APPARATUS

Thermal treatment apparatus, method for manufacturing semiconductor...

Semiconductor Device Producing Method, Substrate Producing Method a...

Thermal treatment apparatus, method for manufacturing semiconductor...

Manufacturing method of a semiconductor device and substrate cleani...

Heat Treating Apparatus

Heat Treatment Apparatus

Thermal Treatment Apparatus, Method For Manufacturing Semiconductor...