Naoya HATAKEYAMA

Person

Ashigarakami-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,835,849
- Issue date Dec 5, 2023
- FUJIFILM Corporation
- Tsutomu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,687,001
- Issue date Jun 27, 2023
- FUJIFILM Corporation
- Tsutomu Yoshimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,650,501
- Issue date May 16, 2023
- FUJIFILM Corporation
- Tsutomu Yoshimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming upper layer film, pattern forming method, r...
- Patent number 11,281,103
- Issue date Mar 22, 2022
- FUJIFILM Corporation
- Naoya Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 11,150,557
- Issue date Oct 19, 2021
- FUJIFILM Corporation
- Naoya Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Electrolytic solution for non-aqueous secondary battery and non-aqu...
- Patent number 10,923,769
- Issue date Feb 16, 2021
- FUJIFILM Corporation
- Shohei Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for producing electronic device, and...
- Patent number 10,859,914
- Issue date Dec 8, 2020
- FUJIFILM Corporation
- Naoya Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nitrogen-containing carbon alloy, method for producing same, carbon...
- Patent number 9,862,605
- Issue date Jan 9, 2018
- FUJIFILM Corporation
- Jun Tanabe
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240004293
- Publication date Jan 4, 2024
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230400769
- Publication date Dec 14, 2023
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230194983
- Publication date Jun 22, 2023
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220146937
- Publication date May 12, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220137512
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210055653
- Publication date Feb 25, 2021
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD...
- Publication number 20200301281
- Publication date Sep 24, 2020
- FUJIFILM CORPORATION
- Yasunori Yonekuta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200019058
- Publication date Jan 16, 2020
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY AND NON-AQU...
- Publication number 20190157720
- Publication date May 23, 2019
- FUJIFILM CORPORATION
- Shohei KATAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190137875
- Publication date May 9, 2019
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180299776
- Publication date Oct 18, 2018
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180292751
- Publication date Oct 11, 2018
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANI...
- Publication number 20180120706
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- B32 - LAYERED PRODUCTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20180011406
- Publication date Jan 11, 2018
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD, R...
- Publication number 20170371244
- Publication date Dec 28, 2017
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...
- Publication number 20170322490
- Publication date Nov 9, 2017
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING NITROGEN-CONTAINING CARBON ALLOY, NITROGEN...
- Publication number 20150376218
- Publication date Dec 31, 2015
- FUJIFILM CORPORATION
- Jun TANABE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NITROGEN-CONTAINING CARBON ALLOY, METHOD FOR PRODUCING SAME, CARBON...
- Publication number 20140356760
- Publication date Dec 4, 2014
- FUJIFILM CORPORATION
- Jun TANABE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Naoya HATAKEYAMA

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Composition for forming upper layer film, pattern forming method, r...

Pattern forming method, method for manufacturing electronic device,...

Electrolytic solution for non-aqueous secondary battery and non-aqu...

Pattern forming method, method for producing electronic device, and...

Nitrogen-containing carbon alloy, method for producing same, carbon...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY AND NON-AQU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANI...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD, R...

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...

METHOD FOR MANUFACTURING NITROGEN-CONTAINING CARBON ALLOY, NITROGEN...

NITROGEN-CONTAINING CARBON ALLOY, METHOD FOR PRODUCING SAME, CARBON...