Naoya Inoue

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,688
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,579,526
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
- Patent number 11,548,844
- Issue date Jan 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
- Patent number 11,429,023
- Issue date Aug 30, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, positive resist composition, and resist pattern...
- Patent number 11,124,477
- Issue date Sep 21, 2021
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt, chemically amplified positive resist composition, and r...
- Patent number 11,036,136
- Issue date Jun 15, 2021
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FO...
- Publication number 20220404701
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi MASUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220308451
- Publication date Sep 29, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220260909
- Publication date Aug 18, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION...
- Publication number 20220197140
- Publication date Jun 23, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20220113626
- Publication date Apr 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20210395195
- Publication date Dec 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301275
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301274
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING...
- Publication number 20200133121
- Publication date Apr 30, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN...
- Publication number 20200071268
- Publication date Mar 5, 2020
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...
- Publication number 20190361347
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20190361350
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Naoya Inoue

Person

Patents Grantslast 30 patents

Onium salt, chemically amplified negative resist composition, and p...

Onium salt, chemically amplified negative resist composition, and p...

Resist composition and patterning process

Resist composition and patterning process

Monomer, polymer, negative resist composition, photomask blank, and...

Onium salt, negative resist composition, and resist pattern forming...

Sulfonium compound, positive resist composition, and resist pattern...

Onium salt, chemically amplified positive resist composition, and r...

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FO...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION...

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING...

SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN...

MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...