Naoya Sugimoto

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 8,080,361
- Issue date Dec 20, 2011
- FUJIFILM Corporation
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition, and cured relief pattern production met...
- Patent number 7,615,324
- Issue date Nov 10, 2009
- FUJIFILM Corporation
- Kenichiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, production method for cured relie...
- Patent number 7,598,009
- Issue date Oct 6, 2009
- FUJIFILM Corporation
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...
- Publication number 20120058431
- Publication date Mar 8, 2012
- FUJIFILM CORPORATION
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...
- Publication number 20100028803
- Publication date Feb 4, 2010
- FUJIFILM CORPORATION
- Naoya SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METH...
- Publication number 20090280440
- Publication date Nov 12, 2009
- FUJIFILM CORPORATION
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIE...
- Publication number 20090035693
- Publication date Feb 5, 2009
- FUJIFILM CORPORATION
- Kenichiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION MET...
- Publication number 20080227024
- Publication date Sep 18, 2008
- FUJIFILM CORPORATION
- Kenichiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080096134
- Publication date Apr 24, 2008
- FUJIFILM CORPORATION
- Naoya SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive composition and method of forming pattern u...
- Publication number 20070172761
- Publication date Jul 26, 2007
- FUJIFILM Corporation
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Naoya Sugimoto

Person

Patents Grantslast 30 patents

Positive photosensitive composition and method of forming pattern u...

Positive photosensitive composition and method of forming pattern u...

Photosensitive composition, and cured relief pattern production met...

Photosensitive resin composition, production method for cured relie...

Patents Applicationslast 30 patents

POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...

SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...

SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METH...

PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIE...

PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION MET...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Positive photosensitive composition and method of forming pattern u...