Naoya Uchiyama

Person

Kurashiki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for purifying compound or resin
- Patent number 9,920,024
- Issue date Mar 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, material for forming underlayer film for lithography, und...
- Patent number 9,828,355
- Issue date Nov 28, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, material for forming underlayer film for lithography, und...
- Patent number 9,809,601
- Issue date Nov 7, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer film-forming material for lithography, underlayer film f...
- Patent number 9,316,913
- Issue date Apr 19, 2016
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Naphthalene formaldehyde resin, deacetalized naphthalene formaldehy...
- Patent number 9,200,105
- Issue date Dec 1, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Naoya Uchiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic resin and material for forming underlayer film for lithogr...
- Patent number 9,110,373
- Issue date Aug 18, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Naoya Uchiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aromatic hydrocarbon resin, underlayer film forming composition for...
- Patent number 8,741,553
- Issue date Jun 3, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Go Higashihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COM...
- Publication number 20200002307
- Publication date Jan 2, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Naoya UCHIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PURIFYING COMPOUND OR RESIN
- Publication number 20170001972
- Publication date Jan 5, 2017
- Masatoshi ECHIGO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UND...
- Publication number 20150376202
- Publication date Dec 31, 2015
- MITSUBISHI GAS CHEMICAL COMPANY, INC
- Masatoshi Echigo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UND...
- Publication number 20150376158
- Publication date Dec 31, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
EPOXY RESIN, PRODUCTION METHOD THEREOF, EPOXY RESIN COMPOSITION, AN...
- Publication number 20150322308
- Publication date Nov 12, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MATERIAL FOR FORMING UNDERLAYER FILM LITHOGRAPHY, UNDERLAYER FILM...
- Publication number 20150090691
- Publication date Apr 2, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACIDIC TREATMENT-SUBJECTED MONOALKYLNAPHTHALENE FORMALDEHYDE RESIN
- Publication number 20150037736
- Publication date Feb 5, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Naoya Uchiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NAPHTHALENE FORMALDEHYDE RESIN, DEACETALIZED NAPHTHALENE FORMALDEHY...
- Publication number 20150018499
- Publication date Jan 15, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Naoya Uchiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER...
- Publication number 20140246400
- Publication date Sep 4, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Go Higashihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHENOLIC RESIN AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGR...
- Publication number 20140186776
- Publication date Jul 3, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Naoya Uchiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AROMATIC HYDROCARBON RESIN, UNDERLAYER FILM FORMING COMPOSITION FOR...
- Publication number 20130280655
- Publication date Oct 24, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Go Higashihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Naoya Uchiyama

Person

Patents Grantslast 30 patents

Method for purifying compound or resin

Compound, material for forming underlayer film for lithography, und...

Compound, material for forming underlayer film for lithography, und...

Underlayer film-forming material for lithography, underlayer film f...

Naphthalene formaldehyde resin, deacetalized naphthalene formaldehy...

Phenolic resin and material for forming underlayer film for lithogr...

Aromatic hydrocarbon resin, underlayer film forming composition for...

Patents Applicationslast 30 patents

METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COM...

METHOD FOR PURIFYING COMPOUND OR RESIN

COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UND...

COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UND...

EPOXY RESIN, PRODUCTION METHOD THEREOF, EPOXY RESIN COMPOSITION, AN...

MATERIAL FOR FORMING UNDERLAYER FILM LITHOGRAPHY, UNDERLAYER FILM...

ACIDIC TREATMENT-SUBJECTED MONOALKYLNAPHTHALENE FORMALDEHYDE RESIN

NAPHTHALENE FORMALDEHYDE RESIN, DEACETALIZED NAPHTHALENE FORMALDEHY...

RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER...

PHENOLIC RESIN AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGR...

AROMATIC HYDROCARBON RESIN, UNDERLAYER FILM FORMING COMPOSITION FOR...