Naoyuki Kofuji

Person

Kunitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,398,371
- Issue date Jul 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer, method for determining processing control parameter, subs...
- Patent number 11,287,782
- Issue date Mar 29, 2022
- Hitachi, Ltd.
- Takeshi Ohmori
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Search device, search method and plasma processing apparatus
- Patent number 11,189,470
- Issue date Nov 30, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeshi Ohmori
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substitute sample, method for determining control parameter of proc...
- Patent number 11,152,237
- Issue date Oct 19, 2021
- Hitachi, Ltd.
- Hyakka Nakada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 10,418,224
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,418,254
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical element, manufacturing method of optical element, and optic...
- Patent number 10,310,321
- Issue date Jun 4, 2019
- MAXELL, LTD.
- Koji Hirata
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,997,337
- Issue date Jun 12, 2018
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 9,960,014
- Issue date May 1, 2018
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical element and optical device
- Patent number 9,933,553
- Issue date Apr 3, 2018
- Hitachi Maxell, Ltd.
- Koji Hirata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,099,349
- Issue date Aug 4, 2015
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,076,637
- Issue date Jul 7, 2015
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,791,027
- Issue date Jul 29, 2014
- Hitachi, Ltd.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,546,266
- Issue date Oct 1, 2013
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,129,283
- Issue date Mar 6, 2012
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control method of a temperature of a sample
- Patent number 8,093,529
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- G01 - MEASURING TESTING
Information Patent Grant
Pressure control device for low pressure processing chamber
- Patent number 7,680,563
- Issue date Mar 16, 2010
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus
- Patent number 7,604,709
- Issue date Oct 20, 2009
- Hitachi, Ltd.
- Masaru Kurihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device...
- Patent number 7,479,459
- Issue date Jan 20, 2009
- Elpida Memory, Inc.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 7,396,771
- Issue date Jul 8, 2008
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device having a W/WN/polys...
- Patent number 7,371,692
- Issue date May 13, 2008
- Elpida Memory, Inc.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method of a specimen and surface processing appa...
- Patent number 7,049,243
- Issue date May 23, 2006
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and method of producing semiconductor de...
- Patent number 6,797,112
- Issue date Sep 28, 2004
- Hitachi, Ltd.
- Naoshi Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor devices including wiring formi...
- Patent number 6,784,109
- Issue date Aug 31, 2004
- Hitachi, Ltd.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen surface processing method
- Patent number 6,677,244
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching device and dry etching method
- Patent number 6,573,190
- Issue date Jun 3, 2003
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen surface processing method and apparatus
- Patent number 6,492,277
- Issue date Dec 10, 2002
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and system
- Patent number 6,332,425
- Issue date Dec 25, 2001
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and system
- Patent number 6,231,777
- Issue date May 15, 2001
- Hitachi, Ltd.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230282491
- Publication date Sep 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220319809
- Publication date Oct 6, 2022
- Hitachi High-Tech Corporation
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING APPARATUS AND DRY ETCHING METHOD
- Publication number 20210335625
- Publication date Oct 28, 2021
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200328099
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substitute Sample, Method for Determining Control Parameter of Proc...
- Publication number 20200273732
- Publication date Aug 27, 2020
- Hitachi, Ltd
- Hyakka NAKADA
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190295823
- Publication date Sep 26, 2019
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEARCH DEVICE, SEARCH METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190295827
- Publication date Sep 26, 2019
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190067032
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Computer, Method for Determining Processing Control Parameter, Subs...
- Publication number 20190064755
- Publication date Feb 28, 2019
- Hitachi, Ltd
- Takeshi OHMORI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20180233329
- Publication date Aug 16, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180122665
- Publication date May 3, 2018
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
- Publication number 20180047595
- Publication date Feb 15, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20170084430
- Publication date Mar 23, 2017
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE CLEANING APPARATUS AND SAMPLE CLEANING METHOD
- Publication number 20160079055
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150348763
- Publication date Dec 3, 2015
- Hitachi High-Technologies Corporation
- Masahito MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ELEMENT, MANUFACTURING METHOD OF OPTICAL ELEMENT, AND OPTIC...
- Publication number 20150234230
- Publication date Aug 20, 2015
- Koji Hirata
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT AND OPTICAL DEVICE
- Publication number 20150226896
- Publication date Aug 13, 2015
- Koji Hirata
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140175534
- Publication date Jun 26, 2014
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20140116621
- Publication date May 1, 2014
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20130087285
- Publication date Apr 11, 2013
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20110297533
- Publication date Dec 8, 2011
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110253672
- Publication date Oct 20, 2011
- Hitachi High-Technologies Corporation
- Masami Kamibayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100311246
- Publication date Dec 9, 2010
- Hitachi, Ltd.
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20100167426
- Publication date Jul 1, 2010
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE TEMPERATURE CONTROL METHOD
- Publication number 20090310645
- Publication date Dec 17, 2009
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...
- Publication number 20090098669
- Publication date Apr 16, 2009
- Elpida Memory, Inc.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20080190893
- Publication date Aug 14, 2008
- Hitachi High-Technologies Corporation
- Masahito Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pressure Control Device for Low Pressure Processing Chamber
- Publication number 20080183340
- Publication date Jul 31, 2008
- Naoyuki KOFUJI
- G05 - CONTROLLING REGULATING
Information Patent Application
Control Method for plasma etching apparatus
- Publication number 20080154422
- Publication date Jun 26, 2008
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20080078505
- Publication date Apr 3, 2008
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS

Naoyuki Kofuji

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Computer, method for determining processing control parameter, subs...

Search device, search method and plasma processing apparatus

Substitute sample, method for determining control parameter of proc...

Plasma etching method

Etching method and etching apparatus

Optical element, manufacturing method of optical element, and optic...

Plasma processing method and plasma processing apparatus

Plasma etching method

Optical element and optical device

Semiconductor device manufacturing method

Plasma processing method and plasma processing apparatus

Method of manufacturing semiconductor device

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Control method of a temperature of a sample

Pressure control device for low pressure processing chamber

Plasma processing apparatus

Semiconductor device manufacturing method and semiconductor device...

Plasma etching apparatus and plasma etching method

Method for manufacturing a semiconductor device having a W/WN/polys...

Surface processing method of a specimen and surface processing appa...

Plasma treatment apparatus and method of producing semiconductor de...

Method for fabricating semiconductor devices including wiring formi...

Specimen surface processing method

Dry etching device and dry etching method

Specimen surface processing method and apparatus

Surface treatment method and system

Surface treatment method and system

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

DRY ETCHING APPARATUS AND DRY ETCHING METHOD

PLASMA PROCESSING METHOD

Substitute Sample, Method for Determining Control Parameter of Proc...

PLASMA PROCESSING APPARATUS

SEARCH DEVICE, SEARCH METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

Computer, Method for Determining Processing Control Parameter, Subs...

PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME

PLASMA ETCHING METHOD

SAMPLE CLEANING APPARATUS AND SAMPLE CLEANING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

OPTICAL ELEMENT, MANUFACTURING METHOD OF OPTICAL ELEMENT, AND OPTIC...

OPTICAL ELEMENT AND OPTICAL DEVICE

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

SAMPLE TEMPERATURE CONTROL METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...

Plasma processing method and plasma processing apparatus

Pressure Control Device for Low Pressure Processing Chamber

Control Method for plasma etching apparatus

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD