Naoyuki Koyama

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 10,040,971
- Issue date Aug 7, 2018
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Cmp polishing slurry and method of polishing substrate
- Patent number 9,293,344
- Issue date Mar 22, 2016
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 9,165,777
- Issue date Oct 20, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 9,129,900
- Issue date Sep 8, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing slurry and method of polishing substrate
- Patent number 8,900,335
- Issue date Dec 2, 2014
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Materials for polishing liquid for metal, polishing liquid for meta...
- Patent number 8,900,477
- Issue date Dec 2, 2014
- Hitachi, Ltd.
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 8,617,275
- Issue date Dec 31, 2013
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
CMP abrasive slurry for polishing insulation film, polishing method...
- Patent number 8,524,111
- Issue date Sep 3, 2013
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Materials for polishing liquid for metal, polishing liquid for meta...
- Patent number 8,226,849
- Issue date Jul 24, 2012
- Hitachi, Ltd.
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 8,168,541
- Issue date May 1, 2012
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,075,800
- Issue date Dec 13, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP abrasive, method for polishing substrate and method for manufac...
- Patent number 8,002,860
- Issue date Aug 23, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing compound and polishing method
- Patent number 7,838,482
- Issue date Nov 23, 2010
- Hitachi Chemical Co. Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 7,837,800
- Issue date Nov 23, 2010
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Materials for polishing liquid for metal, polishing liquid for meta...
- Patent number 7,799,686
- Issue date Sep 21, 2010
- Hitachi, Ltd.
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Abrasive compound for CMP, method for polishing substrate and metho...
- Patent number 7,410,409
- Issue date Aug 12, 2008
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Materials for polishing liquid for metal, polishing liquid for meta...
- Patent number 7,250,369
- Issue date Jul 31, 2007
- Hitachi, Ltd.
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing compound and method for polishing substrate
- Patent number 6,786,945
- Issue date Sep 7, 2004
- Hitachi Chemical Co., Ltd.
- Youichi Machii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20170009102
- Publication date Jan 12, 2017
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20150361303
- Publication date Dec 17, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION, MOLDED BODY AND COMPOSITE MOLDED BODY
- Publication number 20150135992
- Publication date May 21, 2015
- Hitachi Chemical Company, Ltd.
- Mika Kobune
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20130252426
- Publication date Sep 26, 2013
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION, MOLDED BODY AND COMPOSITE MOLDED BODY
- Publication number 20120302699
- Publication date Nov 29, 2012
- Hitachi Chemical Company, Ltd.
- Mika Kobune
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHI...
- Publication number 20110039475
- Publication date Feb 17, 2011
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING SLURRY AND POLISHING METHOD
- Publication number 20110028073
- Publication date Feb 3, 2011
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20100210109
- Publication date Aug 19, 2010
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFAC...
- Publication number 20090253355
- Publication date Oct 8, 2009
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...
- Publication number 20090047786
- Publication date Feb 19, 2009
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080254717
- Publication date Oct 16, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP polishing slurry and polishing method
- Publication number 20080214093
- Publication date Sep 4, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR META...
- Publication number 20080121840
- Publication date May 29, 2008
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080003925
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DE...
- Publication number 20070270085
- Publication date Nov 22, 2007
- Ryo Ota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20070218811
- Publication date Sep 20, 2007
- HITACHI CHEMICAL CO., Ltd.
- Yasushi Kurata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP abrasive, method for polishing substrate and method for manufac...
- Publication number 20070169421
- Publication date Jul 26, 2007
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Materials for polishing liquid for metal, polishing liquid for meta...
- Publication number 20070167017
- Publication date Jul 19, 2007
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hazardous substance decomposer and process for producing the same
- Publication number 20060289826
- Publication date Dec 28, 2006
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Materials for polishing liquid for metal, polishing liquid for meta...
- Publication number 20060216939
- Publication date Sep 28, 2006
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cmp polishing compound and polishing method
- Publication number 20060148667
- Publication date Jul 6, 2006
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing compound and method for polishing substrate
- Publication number 20040065022
- Publication date Apr 8, 2004
- Youichi Machii
- C01 - INORGANIC CHEMISTRY

Naoyuki Koyama

Person

Patents Grantslast 30 patents

Polishing agent and method for polishing substrate using the polish...

Cmp polishing slurry and method of polishing substrate

Polishing agent and method for polishing substrate using the polish...

Polishing agent and method for polishing substrate using the polish...

CMP polishing slurry and method of polishing substrate

Materials for polishing liquid for metal, polishing liquid for meta...

Polishing agent and method for polishing substrate using the polish...

CMP abrasive slurry for polishing insulation film, polishing method...

Materials for polishing liquid for metal, polishing liquid for meta...

CMP polishing slurry and polishing method

Polishing slurry and polishing method

CMP abrasive, method for polishing substrate and method for manufac...

CMP polishing compound and polishing method

CMP polishing slurry and polishing method

Materials for polishing liquid for metal, polishing liquid for meta...

Abrasive compound for CMP, method for polishing substrate and metho...

Materials for polishing liquid for metal, polishing liquid for meta...

Polishing compound and method for polishing substrate

Patents Applicationslast 30 patents

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

RESIN COMPOSITION, MOLDED BODY AND COMPOSITE MOLDED BODY

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

RESIN COMPOSITION, MOLDED BODY AND COMPOSITE MOLDED BODY

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHI...

CMP POLISHING SLURRY AND POLISHING METHOD

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFAC...

CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...

Cmp Polishing Slurry and Method of Polishing Substrate

CMP polishing slurry and polishing method

MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR META...

Cmp Polishing Slurry and Method of Polishing Substrate

CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DE...

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

CMP abrasive, method for polishing substrate and method for manufac...

Materials for polishing liquid for metal, polishing liquid for meta...

Hazardous substance decomposer and process for producing the same

Materials for polishing liquid for metal, polishing liquid for meta...

Cmp polishing compound and polishing method

Polishing compound and method for polishing substrate