Naresh K. Penta

Person

Potsdam, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Aqueous compositions of low dishing silica particles for polysilico...
- Patent number 10,822,524
- Issue date Nov 3, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing compositions and methods having enhan...
- Patent number 10,787,592
- Issue date Sep 29, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- Naresh Kumar Penta
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous silica slurry and amine carboxylic acid compositions for us...
- Patent number 10,711,158
- Issue date Jul 14, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing compositions and methods for suppress...
- Patent number 10,626,298
- Issue date Apr 21, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous silica slurry and amine carboxylic acid compositions select...
- Patent number 10,584,265
- Issue date Mar 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous low abrasive silica slurry and amine carboxylic acid compos...
- Patent number 10,508,221
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous silica slurry compositions for use in shallow trench isolat...
- Patent number 10,316,218
- Issue date Jun 11, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous silica slurry compositions for use in shallow trench isolat...
- Patent number 10,221,336
- Issue date Mar 5, 2019
- rohm and Hass Electronic Materials CMP Holdings, Inc.
- Julia Kozhukh
- B24 - GRINDING POLISHING
Information Patent Grant
Low-abrasive CMP slurry compositions with tunable selectivity
- Patent number 10,119,048
- Issue date Nov 6, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing composition for polishing silicon waf...
- Patent number 9,150,759
- Issue date Oct 6, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stable, concentratable silicon wafer polishing composition and rela...
- Patent number 8,801,959
- Issue date Aug 12, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon wafer polishing composition and related methods
- Patent number 8,795,548
- Issue date Aug 5, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tunable polish rates by varying dissolved oxygen content
- Patent number 8,778,203
- Issue date Jul 15, 2014
- Clarkson University
- P. R. Veera Dandu
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING S...
- Publication number 20200362198
- Publication date Nov 19, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...
- Publication number 20190185714
- Publication date Jun 20, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...
- Publication number 20190092972
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOS...
- Publication number 20190092970
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS ANIONIC FUNCTIONAL SILICA SLURRY AND AMINE CARBOXYLIC ACID...
- Publication number 20190092971
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS FOR US...
- Publication number 20190092973
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...
- Publication number 20190062593
- Publication date Feb 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...
- Publication number 20180362805
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Julia Kozhukh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...
- Publication number 20150093900
- Publication date Apr 2, 2015
- NITTA HAAS INCORPORATED
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tunable Polish Rates By Varying Dissolved Oxygen Content
- Publication number 20140299271
- Publication date Oct 9, 2014
- Clarkson University
- P.R. Veera Dandu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Abrasive Free Silicon Chemical Mechanical Planarization
- Publication number 20120190200
- Publication date Jul 26, 2012
- Clarkson University
- Naresh K. Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tunable Polish Rates By Varying Dissolved Oxygen Content
- Publication number 20110294404
- Publication date Dec 1, 2011
- Clarkson University
- P.R. Veera Dandu
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Naresh K. Penta

Person

Patents Grantslast 30 patents

Aqueous compositions of low dishing silica particles for polysilico...

Chemical mechanical polishing compositions and methods having enhan...

Aqueous silica slurry and amine carboxylic acid compositions for us...

Chemical mechanical polishing compositions and methods for suppress...

Aqueous silica slurry and amine carboxylic acid compositions select...

Aqueous low abrasive silica slurry and amine carboxylic acid compos...

Aqueous silica slurry compositions for use in shallow trench isolat...

Aqueous silica slurry compositions for use in shallow trench isolat...

Low-abrasive CMP slurry compositions with tunable selectivity

Chemical mechanical polishing composition for polishing silicon waf...

Stable, concentratable silicon wafer polishing composition and rela...

Silicon wafer polishing composition and related methods

Tunable polish rates by varying dissolved oxygen content

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING S...

AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...

AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...

AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOS...

AQUEOUS ANIONIC FUNCTIONAL SILICA SLURRY AND AMINE CARBOXYLIC ACID...

AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS FOR US...

AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...

AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...

CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...

Tunable Polish Rates By Varying Dissolved Oxygen Content

Abrasive Free Silicon Chemical Mechanical Planarization

Tunable Polish Rates By Varying Dissolved Oxygen Content