Naruhiko Kaji

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of semiconductor device with filling insulatin...
- Patent number 7,371,654
- Issue date May 13, 2008
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating multilayer interconnect wiring structure havi...
- Patent number 7,084,077
- Issue date Aug 1, 2006
- Kabushiki Kaisha Toshiba
- Naruhiko Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas circulating-processing apparatus
- Patent number 6,938,638
- Issue date Sep 6, 2005
- Kabushiki Kaisha Toshiba
- Hiroshi Kubota
- G05 - CONTROLLING REGULATING
Information Patent Grant
Manufacturing method of semiconductor device with filling insulatin...
- Patent number 6,798,038
- Issue date Sep 28, 2004
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,368,977
- Issue date Apr 9, 2002
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD apparatus with high throughput and cleaning method therefor
- Patent number 6,164,295
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Akio Ui
- B08 - CLEANING
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 6,153,509
- Issue date Nov 28, 2000
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for generating ozone and methods of its use
- Patent number 5,792,326
- Issue date Aug 11, 1998
- Minoru Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ozonizer
- Patent number 5,794,114
- Issue date Aug 11, 1998
- Ebara Corporation
- Minoru Harada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Ozone generating apparatus
- Patent number 5,702,673
- Issue date Dec 30, 1997
- Ebara Corporation
- Naruhiko Kaji
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for generating ozone and methods of its use
- Patent number 5,632,868
- Issue date May 27, 1997
- Ebara Corporation
- Minoru Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon oxide on a semiconductor
- Patent number 5,571,578
- Issue date Nov 5, 1996
- Kabushiki Kaisha Tohsiba
- Naruhiko Kaji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20060189092
- Publication date Aug 24, 2006
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming inorganic porus film
- Publication number 20050181576
- Publication date Aug 18, 2005
- Semiconductor Leading Edge Technologies, Inc.
- Shinichi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating multilayer interconnect wiring structure havi...
- Publication number 20050085097
- Publication date Apr 21, 2005
- Semiconductor Leading Edge Technologies, Inc.
- Naruhiko Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040188675
- Publication date Sep 30, 2004
- Semiconductor Leading Edge Technologies, Inc.
- Naruhiko Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20040173870
- Publication date Sep 9, 2004
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device with cupper wiring and method for manufacturin...
- Publication number 20040150075
- Publication date Aug 5, 2004
- Semiconductor Leading Edge Technologies, Inc.
- Naruhiko Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20030052384
- Publication date Mar 20, 2003
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas circulating-processing apparatus
- Publication number 20020134429
- Publication date Sep 26, 2002
- Hiroshi Kubota
- G05 - CONTROLLING REGULATING

Naruhiko Kaji

Person

Patents Grantslast 30 patents

Manufacturing method of semiconductor device with filling insulatin...

Method of fabricating multilayer interconnect wiring structure havi...

Gas circulating-processing apparatus

Manufacturing method of semiconductor device with filling insulatin...

Semiconductor device manufacturing method

CVD apparatus with high throughput and cleaning method therefor

Method of manufacturing a semiconductor device

Method and apparatus for generating ozone and methods of its use

Ozonizer

Ozone generating apparatus

Method and apparatus for generating ozone and methods of its use

Method for forming silicon oxide on a semiconductor

Patents Applicationslast 30 patents

Manufacturing method of semiconductor device with filling insulatin...

Method for forming inorganic porus film

Method of fabricating multilayer interconnect wiring structure havi...

Semiconductor device and method of manufacturing the same

Manufacturing method of semiconductor device with filling insulatin...

Semiconductor device with cupper wiring and method for manufacturin...

Manufacturing method of semiconductor device with filling insulatin...

Gas circulating-processing apparatus