Nathan Speer

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Oak Park, IL, US

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Patents Grantslast 30 patents

Information Patent Grant
Polyurethane CMP pads having a high modulus ratio
- Patent number 10,562,149
- Issue date Feb 18, 2020
- Cabot Microelectronics Corporation
- Lin Fu
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLYURETHANE CMP PADS HAVING A HIGH MODULUS RATIO
- Publication number 20170087688
- Publication date Mar 30, 2017
- Cabot Microelectronics Corporation
- Lin FU
- B24 - GRINDING POLISHING