Nathan STAFFORD

Person

Damascas, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,837,474
- Issue date Dec 5, 2023
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,469,110
- Issue date Oct 11, 2022
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 11,430,663
- Issue date Aug 30, 2022
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorocarbon molecules for high aspect ratio oxide etch
- Patent number 11,152,223
- Issue date Oct 19, 2021
- American Air Liquide, Inc.
- Curtis Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for minimizing sidewall damage during low k etch processes
- Patent number 11,024,513
- Issue date Jun 1, 2021
- Air Liquide Electronics U.S. LP
- Chih-Yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 10,720,335
- Issue date Jul 21, 2020
- American Air Liquide, Inc.
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 10,629,451
- Issue date Apr 21, 2020
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 10,607,850
- Issue date Mar 31, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SiN selective etch to SiO2 with non-plasma dry process for 3D NAND...
- Patent number 10,529,581
- Issue date Jan 7, 2020
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Chih-Yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrofluorocarbons containing —NH2 functional group for 3D NAND and...
- Patent number 10,410,878
- Issue date Sep 10, 2019
- American Air Liquide, Inc.
- Hui Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorocarbon molecules for high aspect ratio oxide etch
- Patent number 10,381,240
- Issue date Aug 13, 2019
- American Air Liquide, Inc.
- Curtis Anderson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Methods of minimizing plasma-induced sidewall damage during low K e...
- Patent number 10,347,498
- Issue date Jul 9, 2019
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Chih-yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching semiconductor structures with etch gas
- Patent number 10,115,600
- Issue date Oct 30, 2018
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Rahul Gupta
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 10,103,031
- Issue date Oct 16, 2018
- L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 9,892,932
- Issue date Feb 13, 2018
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching semiconductor structures with etch gas
- Patent number 9,773,679
- Issue date Sep 26, 2017
- American Air Liquide, Inc.
- Rahul Gupta
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorocarbon molecules for high aspect ratio oxide etch
- Patent number 9,514,959
- Issue date Dec 6, 2016
- American Air Liquide, Inc.
- Curtis Anderson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Methods of purifying COS
- Patent number 8,974,758
- Issue date Mar 10, 2015
- American Air Liquide, Inc.
- Asli Ertan
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Purification of trimethylamine
- Patent number 8,664,446
- Issue date Mar 4, 2014
- American Air Liquide, Inc.
- Brian Besancon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Purification of H2Se
- Patent number 8,361,199
- Issue date Jan 29, 2013
- Air Liquide Electronics U.S. LP
- Nathan Stafford
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Methods for checking and calibrating concentration sensors in a sem...
- Patent number 8,191,397
- Issue date Jun 5, 2012
- Air Liquide Electronics U.S. LP
- Francois Doniat
- G01 - MEASURING TESTING
Information Patent Grant
Low decomposition storage of a tantalum precursor
- Patent number 8,088,938
- Issue date Jan 3, 2012
- Air Liquide Electronics U.S. LP
- Nathan Stafford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20240112920
- Publication date Apr 4, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...
- Publication number 20230274943
- Publication date Aug 31, 2023
- Samsung Electronics Co., Ltd.
- Changgil SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF RUNNING AN ETCH PROCESS IN HIGHER SELECTIVITY TO MASK AND...
- Publication number 20230253212
- Publication date Aug 10, 2023
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
- Publication number 20230193460
- Publication date Jun 22, 2023
- American Air Liquide, Inc.
- Phong NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20230026743
- Publication date Jan 26, 2023
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ADSORPTION OF HALOCARBON IMPURITIES CONTAINING CL, BR AND...
- Publication number 20220280908
- Publication date Sep 8, 2022
- American Air Liquide, Inc.
- Anup DORAISWAMY
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...
- Publication number 20220223431
- Publication date Jul 14, 2022
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...
- Publication number 20220208517
- Publication date Jun 30, 2022
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Ayaka NISHIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20200251346
- Publication date Aug 6, 2020
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20200203174
- Publication date Jun 25, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...
- Publication number 20200203127
- Publication date Jun 25, 2020
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Ayaka NISHIYAMA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES
- Publication number 20190326126
- Publication date Oct 24, 2019
- L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Ge...
- Chih-Yu HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH
- Publication number 20190326129
- Publication date Oct 24, 2019
- American Air Liquide, Inc.
- Curtis ANDERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiN SELECTIVE ETCH TO SiO2 WITH NON-PLASMA DRY PROCESS FOR 3D NAND...
- Publication number 20190206696
- Publication date Jul 4, 2019
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Chih-Yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROFLUOROCARBONS CONTAINING –NH2 FUNCTIONAL GROUP FOR 3D NAND AND...
- Publication number 20190131140
- Publication date May 2, 2019
- American Air Liquide, Inc.
- Hui SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20180366336
- Publication date Dec 20, 2018
- American Air Liquide, Inc.
- Peng SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MINIMIZING PLASMA-INDUCED SIDEWALL DAMAGE DURING LOW K E...
- Publication number 20180211845
- Publication date Jul 26, 2018
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Chih-yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20180076046
- Publication date Mar 15, 2018
- American Air Liquide, Inc.
- Peng SHEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS
- Publication number 20170352546
- Publication date Dec 7, 2017
- American Air Liquide, Inc.
- Rahul GUPTA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20170178923
- Publication date Jun 22, 2017
- American Air Liquide, Inc.
- Vijay SURLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES
- Publication number 20170110336
- Publication date Apr 20, 2017
- L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Ge...
- Chih-yu HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20170103901
- Publication date Apr 13, 2017
- American Air Liquide, Inc.
- Peng SHEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH
- Publication number 20170032976
- Publication date Feb 2, 2017
- American Air Liquide, Inc.
- Curtis ANDERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS
- Publication number 20160307764
- Publication date Oct 20, 2016
- American Air Liquide, Inc.
- Rahul GUPTA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH
- Publication number 20150294880
- Publication date Oct 15, 2015
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Curtis ANDERSON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PURIFICATION OF H2SE
- Publication number 20120318140
- Publication date Dec 20, 2012
- American Air Liquide, Inc.
- Nathan STAFFORD
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA ASHING COMPOUNDS AND METHODS OF USE
- Publication number 20120227762
- Publication date Sep 13, 2012
- American Air Liquide, Inc.
- Christian Dussarrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PURIFYING COS
- Publication number 20120051995
- Publication date Mar 1, 2012
- Asli Ertan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Low Decomposition Storage of a Tantalum Precursor
- Publication number 20090163732
- Publication date Jun 25, 2009
- Nathan Stafford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Checking And Calibrating Concentration Sensors In A Sem...
- Publication number 20090151419
- Publication date Jun 18, 2009
- Air Liquide Electronics U.S. LP
- Francois Doniat
- G01 - MEASURING TESTING

Nathan STAFFORD

Person

Patents Grantslast 30 patents

Method to improve profile control during selective etching of silic...

Method to improve profile control during selective etching of silic...

Iodine-containing compounds for etching semiconductor structures

Fluorocarbon molecules for high aspect ratio oxide etch

Methods for minimizing sidewall damage during low k etch processes

Chemistries for TSV/MEMS/power device etching

Method to improve profile control during selective etching of silic...

Iodine-containing compounds for etching semiconductor structures

SiN selective etch to SiO2 with non-plasma dry process for 3D NAND...

Hydrofluorocarbons containing —NH2 functional group for 3D NAND and...

Fluorocarbon molecules for high aspect ratio oxide etch

Methods of minimizing plasma-induced sidewall damage during low K e...

Method of etching semiconductor structures with etch gas

Chemistries for TSV/MEMS/power device etching

Chemistries for TSV/MEMS/power device etching

Method of etching semiconductor structures with etch gas

Fluorocarbon molecules for high aspect ratio oxide etch

Methods of purifying COS

Purification of trimethylamine

Purification of H2Se

Methods for checking and calibrating concentration sensors in a sem...

Low decomposition storage of a tantalum precursor

Patents Applicationslast 30 patents

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...

METHOD OF RUNNING AN ETCH PROCESS IN HIGHER SELECTIVITY TO MASK AND...

DEPOSITION OF IODINE-CONTAINING CARBON FILMS

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

SELECTIVE ADSORPTION OF HALOCARBON IMPURITIES CONTAINING CL, BR AND...

HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...

SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES

SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...

METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES

FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH

SiN SELECTIVE ETCH TO SiO2 WITH NON-PLASMA DRY PROCESS FOR 3D NAND...

HYDROFLUOROCARBONS CONTAINING –NH2 FUNCTIONAL GROUP FOR 3D NAND AND...

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

METHODS OF MINIMIZING PLASMA-INDUCED SIDEWALL DAMAGE DURING LOW K E...

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES

METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH

PURIFICATION OF H2SE

PLASMA ASHING COMPOUNDS AND METHODS OF USE

METHODS OF PURIFYING COS

Low Decomposition Storage of a Tantalum Precursor

Methods For Checking And Calibrating Concentration Sensors In A Sem...