Natsuko KINOSHITA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
- Patent number 11,709,428
- Issue date Jul 25, 2023
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 11,300,877
- Issue date Apr 12, 2022
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...
- Publication number 20240385518
- Publication date Nov 21, 2024
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230400767
- Publication date Dec 14, 2023
- JSR Corporation
- Takuya OMIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...
- Publication number 20230384676
- Publication date Nov 30, 2023
- JSR Corporation
- Takuya OMIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230280652
- Publication date Sep 7, 2023
- JSR CORPORATION
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230236501
- Publication date Jul 27, 2023
- JSR Corporation
- Natsuko Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230104260
- Publication date Apr 6, 2023
- JSR Corporation
- Takuya OMIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20220413385
- Publication date Dec 29, 2022
- JSR Corporation
- Kazuya KIRIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220283498
- Publication date Sep 8, 2022
- JSR Corporation
- Katsuaki NISHIKORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210318613
- Publication date Oct 14, 2021
- JSR Corporation
- Katsuaki NISHIKORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20210284773
- Publication date Sep 16, 2021
- JSR Corporation
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20200393761
- Publication date Dec 17, 2020
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20200102270
- Publication date Apr 2, 2020
- JSR Corporation
- Natsuko KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20200012194
- Publication date Jan 9, 2020
- JSR Corporation
- Motohiro SHIRATANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20180321585
- Publication date Nov 8, 2018
- JSR Corporation
- Natsuko KINOSHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20180319740
- Publication date Nov 8, 2018
- JSR Corporation
- Natsuko KINOSHITA
- C07 - ORGANIC CHEMISTRY

Natsuko KINOSHITA

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method for forming pattern,...

Radiation-sensitive resin composition, resist pattern-forming metho...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...