Natsumi Suehiro

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Saitama, JP

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Patents Grantslast 30 patents

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Positive-working radiation-sensitive mixture
- Patent number 5,843,319
- Issue date Dec 1, 1998
- Hoechst Japan Limited
- Klaus Juergen Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,738,972
- Issue date Apr 14, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material including photoacid and photobase generato...
- Patent number 5,691,100
- Issue date Nov 25, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture comprising a basic iodonium compound
- Patent number 5,663,035
- Issue date Sep 2, 1997
- Hoechst Japan Limited
- Seiya Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Colored, photosensitive resin composition
- Patent number 5,641,594
- Issue date Jun 24, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,595,855
- Issue date Jan 21, 1997
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY