Natsumi TORII

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 12,165,849
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiring abnormality detection method and plasma processing apparatus
- Patent number 12,136,541
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,646,181
- Issue date May 9, 2023
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching device and plasma processing apparatus
- Patent number 10,727,028
- Issue date Jul 28, 2020
- Tokyo Electron Limited
- Natsumi Torii
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,431,433
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230260766
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ETCHING METHOD
- Publication number 20230091584
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230078135
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ETCHING METHOD
- Publication number 20230056323
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIRING ABNORMALITY DETECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220172932
- Publication date Jun 2, 2022
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020576
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20210343503
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHING DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190180986
- Publication date Jun 13, 2019
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180366305
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS

Natsumi TORII

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and etching method

Wiring abnormality detection method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Matching device and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

PLASMA TREATMENT DEVICE AND ETCHING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ETCHING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ETCHING METHOD

WIRING ABNORMALITY DETECTION METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING APPARATUS AND ETCHING METHOD

MATCHING DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD