Natsuyo Morioka

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device yield prediction system and method
- Patent number 7,945,410
- Issue date May 17, 2011
- Hitachi, Ltd.
- Natsuyo Morioka
- G05 - CONTROLLING REGULATING
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Etching system and etching method
- Patent number 6,916,396
- Issue date Jul 12, 2005
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing method
- Patent number 6,881,352
- Issue date Apr 19, 2005
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 6,733,618
- Issue date May 11, 2004
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Inspection system and method for manufacturing electronic devices u...
- Patent number 6,611,728
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Natsuyo Morioka
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...
- Publication number 20090120580
- Publication date May 14, 2009
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR DEVICE YIELD PREDICTION SYSTEM AND METHOD
- Publication number 20080140330
- Publication date Jun 12, 2008
- Natsuyo Morioka
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20070193687
- Publication date Aug 23, 2007
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20060124243
- Publication date Jun 15, 2006
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Etching system and etching method
- Publication number 20050236364
- Publication date Oct 27, 2005
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20050022932
- Publication date Feb 3, 2005
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Etching system and etching method
- Publication number 20040060659
- Publication date Apr 1, 2004
- Natsuyo Morioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching system and etching method
- Publication number 20030230551
- Publication date Dec 18, 2003
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20030113945
- Publication date Jun 19, 2003
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20030003607
- Publication date Jan 2, 2003
- Akira Kagoshima
- G05 - CONTROLLING REGULATING

Natsuyo Morioka

Person

Patents Grantslast 30 patents

Semiconductor device yield prediction system and method

Disturbance-free, recipe-controlled plasma processing system and me...

Etching system and etching method

Disturbance-free, recipe-controlled plasma processing method

Disturbance-free, recipe-controlled plasma processing system and me...

Inspection system and method for manufacturing electronic devices u...

Patents Applicationslast 30 patents

Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...

SEMICONDUCTOR DEVICE YIELD PREDICTION SYSTEM AND METHOD

Disturbance-free, recipe-controlled plasma processing system and me...

Disturbance-free, recipe-controlled plasma processing system and me...

Etching system and etching method

Disturbance-free, recipe-controlled plasma processing system and me...

Etching system and etching method

Etching system and etching method

Disturbance-free, recipe-controlled plasma processing system and me...

Disturbance-free, recipe-controlled plasma processing system and me...