Naushad K. Variam

Person

Marblehead, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bottom implant and airgap isolation for nanosheet semiconductor dev...
- Patent number 11,948,832
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device cavity formation using directional deposition
- Patent number 11,942,361
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Armin Saeedi Vahdat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wordline contact formation in NAND devices
- Patent number 11,778,832
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Armin Saeedi Vahdat
- G11 - INFORMATION STORAGE
Information Patent Grant
Dynamic random access device including two-dimensional array of fin...
- Patent number 11,462,546
- Issue date Oct 4, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement gate formation with angled etch and deposition
- Patent number 11,217,491
- Issue date Jan 4, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method of forming fin device having improved fin liner
- Patent number 10,971,403
- Issue date Apr 6, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate devices and methods of formation using angled ions
- Patent number 10,903,211
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming transistor device having fin cut regions
- Patent number 10,720,357
- Issue date Jul 21, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin damage reduction during punch through implantation of FinFET de...
- Patent number 10,692,775
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin damage reduction during punch through implantation of FinFET de...
- Patent number 10,686,033
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and structure for forming dynamic random access device
- Patent number 10,607,999
- Issue date Mar 31, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method of forming fin device having improved fin liner
- Patent number 10,510,610
- Issue date Dec 17, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement gate formation with angled etch and deposition
- Patent number 10,403,552
- Issue date Sep 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Masking for high temperature implants
- Patent number 9,679,776
- Issue date Jun 13, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for selectively processing three dimensional device
- Patent number 9,337,314
- Issue date May 10, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Nilay A. Pradhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ surface contamination removal for ion implanting
- Patent number 7,544,959
- Issue date Jun 9, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- B08 - CLEANING
Information Patent Grant
Plasma implantation of deuterium for passivation of semiconductor-d...
- Patent number 7,378,335
- Issue date May 27, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion implantation systems and methods using solid source of d...
- Patent number 7,326,937
- Issue date Feb 5, 2008
- Verian Semiconductor Equipment Associates, Inc.
- Sandeep Mehta
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
THREE DIMENSIONAL DEVICE FORMATION USING EARLY REMOVAL OF SACRIFICI...
- Publication number 20230369453
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION PROCESS TO FORM PUNCH THROUGH STOPPER
- Publication number 20230187210
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM IMPLANT AND AIRGAP ISOLATION FOR NANOSHEET SEMICONDUCTOR DEV...
- Publication number 20230089482
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE CAVITY FORMATION USING DIRECTIONAL DEPOSITION
- Publication number 20220399225
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Armin Saeedi Vahdat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORDLINE CONTACT FORMATION IN NAND DEVICES
- Publication number 20220352182
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Armin Saeedi Vahdat
- G11 - INFORMATION STORAGE
Information Patent Application
METHODS FOR FORMING ULTRA-SHALLOW JUNCTIONS HAVING IMPROVED ACTIVATION
- Publication number 20210119022
- Publication date Apr 22, 2021
- Applied Materials, Inc.
- Jae Young Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE DEVICES AND METHODS OF FORMATION USING ANGLED IONS
- Publication number 20210050349
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- ANTHONY RENAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND STRUCTURE FOR FORMING DYNAMIC RANDOM ACCESS DEVICE
- Publication number 20200168612
- Publication date May 28, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN DAMAGE REDUCTION DURING PUNCH THROUGH IMPLANTATION OF FINFET DE...
- Publication number 20200152519
- Publication date May 14, 2020
- Applied Materials, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN DAMAGE REDUCTION DURING PUNCH THROUGH IMPLANTATION OF FINFET DE...
- Publication number 20200152735
- Publication date May 14, 2020
- Applied Materials, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD OF FORMING FIN DEVICE HAVING IMPROVED FIN LINER
- Publication number 20200135573
- Publication date Apr 30, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT GATE FORMATION WITH ANGLED ETCH AND DEPOSITION
- Publication number 20190341315
- Publication date Nov 7, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRUCTURE AND METHOD OF FORMING FIN DEVICE HAVING IMPROVED FIN LINER
- Publication number 20190304841
- Publication date Oct 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TRANSISTOR DEVICE HAVING FIN CUT REGIONS
- Publication number 20190273011
- Publication date Sep 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Min Gyu Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND STRUCTURE FOR FORMING DYNAMIC RANDOM ACCESS DEVICE
- Publication number 20190139964
- Publication date May 9, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Masking For High Temperature Implants
- Publication number 20170025277
- Publication date Jan 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR SELECTIVELY PROCESSING THREE DIMENSIONAL DEVICE
- Publication number 20140162414
- Publication date Jun 12, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Nilay A. Pradhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU SURFACE CONTAMINATION REMOVAL FOR ION IMPLANTING
- Publication number 20080185537
- Publication date Aug 7, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steve Walther
- B08 - CLEANING
Information Patent Application
Plasma implantation of deuterium for passivation of semiconductor-d...
- Publication number 20070123012
- Publication date May 31, 2007
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for plasma implantation with improved dopant...
- Publication number 20070069157
- Publication date Mar 29, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Sandeep Mehta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal work function adjustment by ion implantation
- Publication number 20070048984
- Publication date Mar 1, 2007
- Steven Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma ion implantation systems and methods using solid source of d...
- Publication number 20060219952
- Publication date Oct 5, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Sandeep Mehta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shallow-junction fabrication in semiconductor devices via plasma im...
- Publication number 20060205192
- Publication date Sep 14, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In situ surface contaminant removal for ion implanting
- Publication number 20060040499
- Publication date Feb 23, 2006
- Steve Walther
- B08 - CLEANING

Naushad K. Variam

Person

Patents Grantslast 30 patents

Bottom implant and airgap isolation for nanosheet semiconductor dev...

Semiconductor device cavity formation using directional deposition

Wordline contact formation in NAND devices

Dynamic random access device including two-dimensional array of fin...

Replacement gate formation with angled etch and deposition

Structure and method of forming fin device having improved fin liner

Gate devices and methods of formation using angled ions

Method of forming transistor device having fin cut regions

Fin damage reduction during punch through implantation of FinFET de...

Fin damage reduction during punch through implantation of FinFET de...

Techniques and structure for forming dynamic random access device

Structure and method of forming fin device having improved fin liner

Replacement gate formation with angled etch and deposition

Masking for high temperature implants

Technique for selectively processing three dimensional device

In situ surface contamination removal for ion implanting

Plasma implantation of deuterium for passivation of semiconductor-d...

Plasma ion implantation systems and methods using solid source of d...

Patents Applicationslast 30 patents

THREE DIMENSIONAL DEVICE FORMATION USING EARLY REMOVAL OF SACRIFICI...

ION IMPLANTATION PROCESS TO FORM PUNCH THROUGH STOPPER

BOTTOM IMPLANT AND AIRGAP ISOLATION FOR NANOSHEET SEMICONDUCTOR DEV...

SEMICONDUCTOR DEVICE CAVITY FORMATION USING DIRECTIONAL DEPOSITION

WORDLINE CONTACT FORMATION IN NAND DEVICES

METHODS FOR FORMING ULTRA-SHALLOW JUNCTIONS HAVING IMPROVED ACTIVATION

GATE DEVICES AND METHODS OF FORMATION USING ANGLED IONS

TECHNIQUES AND STRUCTURE FOR FORMING DYNAMIC RANDOM ACCESS DEVICE

FIN DAMAGE REDUCTION DURING PUNCH THROUGH IMPLANTATION OF FINFET DE...

FIN DAMAGE REDUCTION DURING PUNCH THROUGH IMPLANTATION OF FINFET DE...

STRUCTURE AND METHOD OF FORMING FIN DEVICE HAVING IMPROVED FIN LINER

REPLACEMENT GATE FORMATION WITH ANGLED ETCH AND DEPOSITION

STRUCTURE AND METHOD OF FORMING FIN DEVICE HAVING IMPROVED FIN LINER

METHOD OF FORMING TRANSISTOR DEVICE HAVING FIN CUT REGIONS

TECHNIQUES AND STRUCTURE FOR FORMING DYNAMIC RANDOM ACCESS DEVICE

Masking For High Temperature Implants

TECHNIQUE FOR SELECTIVELY PROCESSING THREE DIMENSIONAL DEVICE

IN SITU SURFACE CONTAMINATION REMOVAL FOR ION IMPLANTING

Plasma implantation of deuterium for passivation of semiconductor-d...

Methods and apparatus for plasma implantation with improved dopant...

Metal work function adjustment by ion implantation

Plasma ion implantation systems and methods using solid source of d...

Shallow-junction fabrication in semiconductor devices via plasma im...

In situ surface contaminant removal for ion implanting